本篇論文設計了兩種微平面鏡。第一種微平面鏡稱為離軸微平面鏡，主要是根據光線描線法的概念用來設計出等效的微透鏡光學元件。此微平面鏡可利用電子束微影機及電漿蝕刻技術來製作。我們也從製程上難易程度的觀點來比較繞射光學元件及離軸平面鏡若要達到相同的光學條件所需的最大長寬比，我們得到的結論是：當所需的數值孔徑小於 0.6 時, 製作離軸微平面鏡會比製作 SiO2 材料的繞射光學元件容易；當所需的數值孔徑小於 0.2 時, 製作離軸微平面鏡會比製作GaN 材料的繞射光學元件容易。
第二種設計為一微平面鏡加上光柵。此平面鏡的設計主要是根據羅倫圓定律。此微平面鏡的設計可利用電子束微影機及電漿蝕刻技術來製作，而光柵則可利用濕蝕刻技術來達成。
我們也提出了一種被動式的對準方法將微光學元件組裝到一個矽光學桌上。我們利用電漿蝕刻技術以及濕蝕刻技術來達成此設計的製作。這個設計不但可以讓各種微光學元件都整合在矽光學桌上，並且可以精準的控制每個方向上的對準。

In this dissertation, two kinds of concave micro-mirrors are designed. The off-axis micro-mirror is designed based on ray tracing for the fabrication on silicon substrate using e-beam writer and inductively coupled plasma. The aspect ratios of the surface relief of the diffractive micro-lenses and the micro-mirrors are compared to reduce the fabrication difficulty for the identical optical function. The results show that compared with the micro-lenses in SiO2 and GaN, the micro-mirrors are preferred to be fabricated than micro-lenses if their numerical apertures are lower than 0.6 and 0.2, respectively. Free space echelle grating is designed for Dense Wavelength Division Multiplexing (DWDM) system. It is based on the law of Rowland. It is a hybrid of a concave micro-mirror and blazed gratings. The design of the concave micro-mirror can be carried out on silicon substrate using e-beam writer and plasma etching .The blazed grating can be achieved by fine V-groove etching.
We also demonstrate a novel method to mount micro-opto-electronic devices on a Si bench. Inductively Coupled Plasma ( ICP ) and KOH etching and are performed for carrying out this novel method. The Si-based component after through wafer etching was picked by the optical fibers and placed on the optical bench. This can not only make X, Y, Z, θ and the tilt directions precisely controlled but also be suitable for all components mounting on the optical bench.

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