本論文研究軟X光區域的多層膜高反射鏡及使用銅靶 輻射量測X光反射率，檢測多層膜結構。
關於13.6nm的近垂直入射多層膜高反射鏡，可優化出高反射率的膜層結構。經優化53層鉬矽多層膜，鉬和矽的膜層厚度分別為3.03nm和4.07nm，對S偏振光而言，四分之一波膜堆的理想反射率為69.42%，我們優化後週期性膜堆的理想反射率為72.12%。對p偏振光而言，四分之一波膜堆的理想反射率為65.97%，我們優化後週期性膜堆的理想反射率為69.36%。
由於近垂直入射多層膜高反射鏡對膜厚及粗糙度的要求甚高，因此使用離子束濺鍍法製鍍出非晶態薄膜，藉著銅靶 輻射以掠角入射薄膜，根據Kiessig干涉條紋精準的求得薄膜的特性，包括薄膜密度、消光係數、厚度及各界面粗糙度。求得的結果與原子力顯微鏡比較，並非完全吻合。主要的原因為X光量測的範圍較大，因此提供的訊息是平均值，且包含高頻波。而原子力顯微鏡量測的範圍是局部性，且濾掉高頻波。

The paper is discussed about designing the nearly normal incident multilayer mirrors in the X-Ray region and analyzing the multilayer based on measuring X-Ray reflectivity .
For the nearly normal incident multilayer mirrors at 13.6 nm , our program can optimize the structure of the high–reflectivity mirrors . After optimizing the 53 layers Mo/Si mirrors , we can find out that the thickness of the Mo and Si thin film are 3.03nm and 4.07nm . For s-pol. , the reflectivity of the quarter wave stick is 69.42% , and the reflectivity of our design is 72.12% . For p-pol. , the reflectivity of the quarter wave stick is 65.97% , and the reflectivity of our design is 69.36% .
It is important for the thickness mistakes and roughness of nearly normal incident multialyer mirrors . We manufacture the amorphous thin film by using ion beam sputtering deposition , and obtain the characteristics of the multilayers by measuring the X-Ray reflectivity of radiation of Cu target , for example the mass density , extinction coefficient , thickness of the thin film and the roughness of the interface . Generally speaking , the roughnesses by fitting X-Ray reflectivity are different from the roughnesses of using AFM . This result is that the area by X-Ray illuminated is larger than by AFM measuring , and X-Ray reflectivity contains the data of high frequency waves.

[1] 國家毫微米元件實驗室,積體電路製程技術訓練班(II),pp.6.1-6.78
[2] Takeshi Namioka, “Overview of Japanese multilayer research”, SPIE 984, pp.124, 1988
[3] R. C. Catura, E. G. Joki, T. E. Whittemore, W. J. Brookover, “Recent results in multilayer research”, SPIE 984, pp.214, 1988
[4] 李正中, 薄膜光學與鍍膜技術, 藝軒出版社, 1999
[5] E. Spiller, “Low-loss reflection coatings using absorbing materials”, Appl. Phys. Lett., 20(9), pp.365, 1972
[6] Masaki Yamamoto, Takeshi Namioka, “Layer-by-layer design method for soft-x-ray multilayer”, Appl. Opt., 31(10), pp.1622, 1992
[7] E. Spiller, Armin Segmuller, “Cotrolled fabrication of multilayer soft-x-ray mirrors”, Appl. Phys. Lett., 37(11), pp.1048, 1980
[8] 王占山, “極紫外與軟X射線非週期多層膜優化設計及初步研制”, 光學儀器, 25(5-6), pp.138, 2001
[9] Alan G. Michette, Zhanshan Wang, “Optimisation of depth-graded multilayer coatings for broadband reflectivity in the soft X-ray and EUV regions”, Optics Communications, 177, pp.47, 2000
[10] V.V. Protopopov, V.A. Kalnov, “X-ray multilayer mirrors with an extended angular range”, Optics Communications, 158, pp.127, 1998
[11] E. Spiller, in Physics, Fabrication, and Applications of Multilayered Structures, edited by P. Dhez and C. Weisbuch(Plenum, New York), pp.284, 1988
[12] Muamer Zukic, Jongmin Kim, Michele Wilson, Jungho Park, Douglas G. Torr, “Non-grazing high reflective narrowband multilayer x-ray coatings”, SPIE 2011, pp.323, 1993
[13] Paul B. Mirkarimi, Sasa Bajt, Mark A. Wall, “Mo/Si and Mo/Be multilayer thin films on Zerodur substrates for extreme-ultraviolet lithography”, Appl. Opt., 39(10), pp.1617, 2000
[14] Troy W. Barbee, Jr., Stanley Mrowka, Michael C. Hettrick, “Molybdenum-silicon multilayer mirrors for extreme ultraviolet”, Appl. Opt., 24, pp.883, 1985
[15] Claude Montcalm, Brain T. Sullivan, Henri Pepin, J. A. Dobrowolski, M. Sutton, “Extreme-ultraviolet Mo/Si multilayer mirrors deposited by radio-frequency-magnetron sputtering”, Appl. Opt., 33(10), 2057, 1994
[16] A. Ivan, R. Bruni, K. Byun, F. Christensen, P. Gorenstein, S. Romaine, ”Design and optimization of multilayer coatings for hard x-ray mirrors”, SPIE 3773, pp.107, 1999
[17] M. Arbaoui, R. Barchewitz, C. Sella, K.B. Youn, ”Absolute reflectivity measurements at 44.79 of sputter deposited multilayer x-ray mirrors”, Appl. Opt., 29(4), pp.477, 1990
[18] A. V. Tikhonravov, M. K. Trubetskov, V. V. Protopopov, A. V. Voronov, “Application of the needle optimization technique to the design of X-ray mirrors”, SPIE 3738, pp.248, 1999
[19] I. V. Kozhevnikov et al., Nucl. Instrum. and Meth. A 345, pp.594-603, 1994
[20] Benjawan SaeLao, Optics Letters 26( 7) , 2001
[21] T. Salditt et al , Phys. Rev. B 54, pp.5860, 1996
[22] Ken Skulina, Applied Optics 34, pp.3727 , 1995
[23] H.Ch. Mertins, F. Schaefers, H. Grimmer, D. Clemens, P. Boeni, M. Horisberger, Applied Optics 37 , pp.1873-1882, 1998
[24] L.G. Parratt, C.F. Hempstead, “Anomalous dispersion and scattering of X-ray”, Phys. Rev., 94, pp.1593, 1954
[25] Martin Huppauff, Klaus Bange, Bruno Lengeler, “Density ,thickness and interface roughness of SiO2, TiO2 and Ta2O5 films on BK-7 glasses analyzed by X-ray reflection”, Thin solid film, 230, pp.191-198, 1993
[26]許樹恩, 吳泰伯, X光繞射原理與材料結構分析, 中國材料科學學會, pp.138, 1993
[27] E. Spiller, Soft X-Ray Optics, SPIE, pp.145, 1994
[28] Brian L. Evans and Barry J. Kent, “Soft X-ray platinum-carbon multiplayer mirrors”, Appl. Opt., 26, pp.4491, 1987
[29] 1.Masahito NIIBE, Shigetaro OGURA, Masami TSUKAMOTO, Takashi IIZUKA, Akira MIYAKE, Yutaka WATANABE, Yasuaki FUKUDA, “Normal Incidence Multilayer Mirrors for Soft X-Rays”, The Review of Laser Engineering, Vol.24, No.1, 1996, pp.48-60
[30] 光學常數來自http://www-cxro.lbl.gov/optical_constants/
[31] 鄭天水、金慶原、邢中菁、王之江,”用於軟X光反射鏡Ni/C、Mo/Si多層膜的機制”, 真空科學與技術, No.10(4), 1990, pp.269-274
[32] 呂俊霞、曹健林,”8.0nm附近Mo/B4C軟X射線多層膜初步研究”, 光學精密工程, No.4(5), 1996, pp.36-39