壓印微影製程主要利用原先附有圖形之模具，借加壓方式將模具壓入阻劑中，使阻劑產生相對應圖形，此技術可製作奈米等級之結構，具有高解析度、快速生產以及低成本的特點。本研究以奈米壓印微影技術為基本概念，自行設計與製作了平板式直壓印機，以製作微奈米等級之元件。
本文利用聚二甲基矽氧烷 (PDMS)軟模以及溶膠-凝膠 (sol-gels)材料，於自製壓印機的實驗平台內，藉由壓力與溫度參數的控制，快速的壓印製作出微奈米尺寸之光柵元件。並依壓印實驗之結果，對鮮少文獻探討的壓印參數與元件之特徵尺寸做了比較與討論。此外，基於軟模微影之壓印材料與基板的豐富選擇性，本文亦成功將高折射率材料Ta2O5壓印於光學玻璃基板上，成功製作出具有波導功能的光柵。

Nanoimprint lithography (NIL) is a high-resolution, speedy throughput and low cost parallel method in which surface patterns of a stamp is transferred into the material by the external force applied. In this research, the key concept of NIL method was used to fabricate micro/nano component in nanotechnology with the designed and implementation of self-made solid parallel-plate press (SPP) machine.
Within this work, the fabricating process is performed using a polydimethylsiloxane (PDMS) stamp and sol-gels materials with control the experimental parameters as pressure or temperature. The process is carried out inside the imprint device and a micro/nano grating structure was made. Additionally, the dependence of the characteristic size of the device on the imprint parameters was analyzed. Furthermore, the experiment also successfully imprints high refractive index line structure on glass substrate.

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