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研究生： 吳鍇
Kai Wu
論文名稱： 以高靈敏度之監控波長改善光學薄膜之製鍍成效
Improvement of the optical coating process by cutting layers with sensitive monitor wavelengths
指導教授： 李正中
Cheng-Chung Lee
口試委員:
學位類別： 碩士
Master
系所名稱： 理學院 - 光電科學與工程學系
Department of Optics and Photonics
畢業學年度： 93
語文別： 英文
論文頁數： 50
中文關鍵詞： 光學監控 、光學薄膜 、監控靈敏度
外文關鍵詞： optical coating, monitoring sensitivity, optical monitor
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    • 對於一個製程昂貴的光學薄膜元件來說，更為精緻和精確的監控是必要的。本文提出了一個新的監控方法，藉由薄膜光學理論的數學的推演分析，找出不同膜堆的最佳監控波長，並計算出每層膜厚對中心波長的厚度補償。此方法兼具了高靈敏度的監控效果和保持中心波長不偏移的優點。模擬結果證明，以此法監控所製鍍而成的光學濾片，其成效明顯比用傳統的極值點監控法所製鍍者優良。

    For a costly optical element production, more precise monitor method is necessary. A finer monitor method is proposed. Based on numerical analysis, the most sensitive monitor wavelength is clearly found out, and the thickness compensation for central wavelength is calculated. This method not only can cut layers precisely, but also keep the central wavelength in the right position. It is shown that the performance of optical thin film element monitored by this new method is much better than by the turning point method in coating process.

    Contents 摘要 I Abstract II Contents III Figures V 1.Introduction 1 2.Basic Concepts[3] 3 2.1.Introduction to basic physical concept 3 2.2.The transmittance and reflection of the single interface 6 2.3.Equivalent admittance and reflectance of the single layer thin film 8 2.4.Equivalent admittance value of a multilayer thin film 11 3.Conventional Monitor Methods 13 3.1.Quartz-crystal monitor[4] 13 3.2.Turning point monitoring method[5] 15 3.3.Over-shot monitor method[8] 17 4.Principle and Methods of the Selected Sensitive Monitor Wavelength Monitoring Method 20 4.1.Analysis of the sensitivity for different monitor wavelength 20 4.2.Introduction to a novel monitoring method: SSMW method 25 5.Simulation 32 5.1.Comparison between different monitor methods for reflector 32 5.2.Comparison between different monitor methods for narrow-band pass filter 34 5.3.The influence of the bandwidth of monitoring light 38 5.4.The deviation of the material refractive index 41 6.Conclusion 47 7.Future Work 48 8.Reference 49

    1.Cheng Zang, Yongtain Wang, and Weiqiang Lu, 2004, “A single-wavelength monitor method for optical thin-film coatings”, Opt. Eng., 43, pp. 1439-1443.
    2.B. Vidal, 1979, A. Fornier and E Pelletier, “Wideband optical monitoring of nonquarter wave multilayer filter”, Appl. Opt., 18, pp.3851-3856.
    3.Macleod H. A., 1986, “Thin-Film Optical Filters”, Adam Hilger Ltd, Bristol., Chap. 2, pp. 62-66.
    4.Abdul Wajid, 1997, “On the accuracy of the quartz-crystal microbalance (QCM) in thin-film depositions”, Sensors and Actuators A, 63, pp. 41-46.
    5.H. A. Macleod, 1972, “Turning value monitoring of narrow-band all-dielectirc thin-film optical filters”, Optica Acta, 19, pp. 1-28.
    6.H. A. Macleod, 1977, “Error compensation mechanisms in some thin-film monitor systems”, Opt. Acta, 17, pp. 907-930.
    7.Stephane Larouche, Aram Amassian, Bill Baloukas, and Ludvik Martinu, 2004, “Turning-point monitoring is not simply optical thickness compensation”, Optical Interference Coatings Ninth Topical Meeting, TuE8.
    8.P. Bousquet, A. Fornier, R. Kowalczyk, E. Pwlletier, 1972, and P. Roche, “Optical filters: monitoring process allowing the auto-correction of thickness errors”, Thin Solid Films, 13, pp. 285-290.
    9.C.J. van der Laan, 1986, “Optical Monitoring of Nonquarterwave Stacks”, Applied Optics, Vol.25, pp.753-760.
    10.Y. R. Chen, 2004, “Monitor of film growth by admittance diagram”, Master Thesis of National Central University of Taiwan, Chap. 3, pp.15-17.
    11.Macleod H. A., 1981, “Monitor of optical coatings”, Appl. Opt., 20, pp. 82-89.

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