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研究生： 柳佳宏
Chi-Hung Liu
論文名稱： 製造執行系統控制之晶圓製程：建模與模擬分析
Modeling and Simulation of the MES-Controlled Wafer Fabrication Process
指導教授： 高信培
Hsing-Pei Kao
口試委員:
學位類別： 碩士
Master
系所名稱： 管理學院 - 工業管理研究所
Graduate Institute of Industrial Management
畢業學年度： 94
語文別： 英文
論文頁數： 111
中文關鍵詞： 企業流程管理 、半導體製造技術 、製造執行系統
外文關鍵詞： UML, Petri-net, Semiconductor manufacturing, Manufacturing Execution System (MES), Business Process Management (BPM), IDEFØ
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    • 本研究針對製造執行系統在半導體業界之應用提出一套流程管理之方法，以建模及模擬的分析來協助設計製造執行系統處理資訊之活動，以及整合現場工作流程提出完整的方法論。雖然前人文獻中對製造執行系統多有描述，但對於其中處理資訊的程序卻模糊不清，而且少有文獻提到製造執行系統和工廠現場工作流程之間潛在的關係。針對此點，本研究著手於了解製造執行系統完整定義、處理資訊活動程序、各功能模組之間處理資訊之關連以及跟半導體加工工作流程之間的互動關係。
    本研究採用三種流程管理方法論，首先使用IDEFØ定義製造執行系統中各活動，IDEFØ方法論提供製造執行系統活動詳細的資訊輸入、輸出、控制及機制定義。第二，使用活動圖建立製造執行系統各模組處理資訊的程序和決策點，以及建立半導體之工作流程。第三，將活動圖之程序轉換成Petri net完整圖形，可以同步顯示資訊流及工作流之互動關係，並且加上時間參數估計製造執行系統處理資訊之程序對工作流程的時間影響。本研究提供給以物件導向方式進行執造執行系統設計及改善之研究者新的方法工具，可進一步了解詳細流程定義及規畫系統。

    This paper presents a model and simulation for analyzing Manufacturing Execution System (MES) in semiconductor fab, which aims to optimize production activities on the shop floor in a changing environment. Despite the large number of studies that have been done on MES over the past few years, little attention has been given to its potential relation on the semiconductor fab work floor. MES is popular with single plants for controlling and monitoring the production situation. Our model integrates MES with Manufacturing Information System (MIS) to access their effect on both data and object flow as well as decision points in IC production.
    We used IDEFØ to define the activities in MES. IDEFØ provides a formal method of describing processes or systems, using several techniques to avoid the complex diagrams that could result from an attempt at a complete description using other methods. And activity diagram with UML is build for the activities with the modules in MES. Activity diagrams represent the business and operational workflows of a system. An Activity diagram is a dynamic diagram that shows the activity and the event that causes the object to be in the particular state. Finally, the CPNtools is used for modeling the CMOS Workflow, MES information flow and Case discussion.

    Abstract I Table of Content IV List of Figures VII List of Tables X Chapter 1 Introduction 1 1.1. Background Information 1 1.2. Research motivation 4 1.3. Research Goals 4 1.4. Research Approach 7 1.5. Thesis Structure and Chapter Outlines 11 Chapter 2 Literature Review 12 2.1 Domain of Manufacturing Execution System 12 2.1.1 Current Definitions of MES 12 2.1.2 The situation of using MES in Semiconductor Manufacturing 14 2.2 Information Float of Intelligent Manufacturing Systems 17 2.2.1 Configuration of Intelligent Manufacturing Systems 17 2.2.2 Information Flow Interchange of Manufacturing Systems 21 2.3 Famous MES function, framework, characteristics 23 2.3.1 WorkStream DFS 23 2.3.2 POSEIDON 24 2.3.3 PROMIS 26 2.3.4 MIRL-MES 28 Chapter 3 MES Module Interface Architecture 30 3.1 IDEFØ Method 30 3.2 Model MES Activities with IDEFØ 34 3.2.1 Develop Operation Sequence & Detailed schedule 35 3.2.2 Dispatch Production Units 38 3.2.3 Track Production Units &Resources 39 3.2.4 Managing Factory-floor Data Documents 42 3.3 MES with Activity Breakdown 47 Chapter 4 Model Process of MES and CMOS with UML 49 4.1. Model Process of MES with Activity Diagram 49 4.1.1 Resource Allocation and Status Module 50 4.1.2 Operations/Detail Scheduling Module 51 4.1.3 Dispatching Production Units Module 52 4.1.4 Document Control Module 53 4.1.5 Data Collection/Acquisition Module 54 4.1.6 Labor Management Module 55 4.1.7 Quality Management Module 55 4.1.8 Process Management Module 57 4.1.9 Maintenance Management Module 58 4.1.10 Product Tracking and Genealogy Module 58 4.1.11 Performance Analysis Module 59 4.2. CMOS Manufacturing Steps with UML 61 4.2.1 CMOS Front-End-of Line Processing 63 4.2.2 CMOS Back-End-of-Line Processing 68 Chapter 5 Implementation and Simulation with Coloured Petri-net 72 5.1. Coloured Petri-net Method 72 5.2. Transformation of UML Activity Diagram to Petri Nets 76 5.3. Information Flow and Work Flow with Coloured Petri net 78 5.3.1 Information Flow in MES modules 78 5.3.2 CMOS Process Flow 90 5.3.3 Combine Information Flow and CMOS Process Flow 93 5.4. Simulation of the Application Cases with Coloured Petri-net 94 Chapter 6 Conclusion and Recommendations 101 Reference: 103 Appendix A 108

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