本研究使用動態模型模擬感光高分子材料PQ:PMMA內的PQ與光產物分子在受到雙光束干涉曝光時的濃度分布變化，並使用傳遞矩陣(T-matrix)計算其濃度分布作為反射式布拉格光柵的繞射效率。實驗上使用雙光束干涉法(532 nm雷射光)寫入PQ:PMMA材料，製作出中心波長為1055 nm的反射式體積布拉格光柵。透過曝光時、曝光後的繞射效率數據獲取模擬參數，進而能夠利用模擬預測不同曝光方式下的最終繞射效率。另外，模擬預測了間段式曝光法可以得到更高的繞射效率，因此在實驗上使用間段式曝光法寫入PQ:PMMA材料，並得到了更高的繞射效率。

A simulated research based on rate equation was performed to analysis the concentration distributions of molecules in phenanthrenequinone (PQ)-doped PMMA polymer (PQ:PMMA) which was exposed by two beam interference configuration. The concentration distributions were used to predict the diffraction efficiency of PQ:PMMA based volume Bragg grating (VBG) by using transfer matrix method. The simulation result indicated that diffusion effect of PQ molecule was the most important factor that influences the final diffraction efficiency of PQ:PMMA VBG. The simulation result suggested that intermittent exposure method can promote the diffusion of PQ molecule and increase the final diffraction efficiency. A series of experiment validated that the diffraction efficiency of reflective type PQ:PMMA VBG can be predicted.

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