摘要
本研究是使用離子束濺鍍 ( Ion Beam Sputter Deposition)，分別濺鍍Ta及Si兩種材料。量測由離子束濺鍍出來的光學薄膜得知，只要能夠控制好製程參數，便可鍍出膜質緻密、折射率穩定、低散射損耗、低吸收耗損以及非晶態(Amorphous)的優質光學薄膜。建立在這樣條件的優質光學薄膜之後，再對膜厚分佈建立一個適用的描述及分析方法，在此我們以離子束投影在靶材上之密度分佈模式，來模擬實際離子束濺鍍膜厚分佈，而且在模擬過程中，我們將投影面源均勻地分割成有限個發射源，如此對於描述及分析膜厚分佈，有很好的結果。

Abstract
We have deposited Ta2O5 and SiO2 films by ion-beam sputtering. By measuring Ta2O5 and SiO2 films, we find that thin films deposited by ion-beam sputtering have several advantages.
1. High packing density.
2. Refractive index steady.
3. Low scattering loss.
4. Low absorption loss.
5. Amorphous.
Based on these advantages, we establish the method to describe and analyze thickness distribution. We use a concept that the density distribution of ion beam projecting on target to simulate actual thickness distribution. In simulation process, we divide the projecting surface source of target to many uniform emissive sources. A correct thickness distribution by using the concept has been successfully described.

參考文獻
1. David T. Wei , “ Ion beam interference coatings for ultralow optical loss ’’ Appl. Opt. , Vol28 , No.14 , p.2813(1989)
2. 徐進成 , ‘’雙離子束濺鍍光學薄膜之研究’’ , 中央大學光電科學研究所博士論文, p.14 (1997)。
3. 李正中 , ‘’薄膜光學與鍍膜技術’’ , 藝軒出版社 , 台北 , p.394 (1999)。
4. Arvind Jain , ‘’Energy considerations for preparing thin films by ion beam deposition’’ , Thin Solid Film , 219 , p.266(1992)
5. 李正中 , ‘’薄膜光學與鍍膜技術’’ , 藝軒出版社 , 台北 , p.281 (1999)。
6. C. C. Lee , K. P. Chuang , J. Y. Wu , ‘’ Thickness distribution of thin films deposited by ion beam deposition ‘’ , Optical Interference Coatings , July 2001。
7.H. A. Macleod , ’’ Thin-Film Optical Filter ’’ , Macmillan Publishing ,
8.徐進成 , ’’ 雙離子束濺鍍光學薄膜之研究 ’’ , 國立中央大學光電科學研究所博士論文 , p.15(1997).
9. G. K. Wehner , “ Threshold Energies for Sputtering and the Sound Velocity in Metals “ , Phys. Rev. 93 , p.633 (1954).
10. P. J. Martin , ’’ Review Ion-based methods for optical thin film deposition ’’ , Journal of Materials Science , 21 , pp.1~25(1986).
11. Peter Sigmund , ’’Theory of Sputtering Yield of Amorphous and Polycrystalline Target’’ , Phys. Rev.184 , 383(1969).
12. H. Fetz , Z. Phys. 119 , 590(1942).
13. John E. Mahan , ’’ Physical Vapor Deposition of Thin Films ’’ , John Wiley & Sons , Inc. , pp.218(2000).
14. 李正中 , ‘’ 薄膜光學與鍍膜技術 ’’ , 藝軒圖書出版社 , pp.282.(1999).
15. Harold R. Kaufman and Raymond S. Robinson , ‘’ Operation of Broad-Beam Sources ’’ , Commonwealth Scientific Corporation , pp.5.(1987).
16. Harold R. Kaufman and Raymond S. Robinson , ‘’ Operation of Broad-Beam Sources ’’ , Commonwealth Scientific Corporation , pp.6. (1987).
17. J Reece Roth , ‘’ Industrial Plasma Engineering Volume 1 : Principles ’’ , Institute of Physics Publishing Bristol and Philadelphia , pp.100.(1995).
18. 李正中 , ‘’ 薄膜光學與鍍膜技術 ’’ , 藝軒圖書出版社 , pp.283.(1999).
19. J Reece Roth , ‘’ Industrial Plasma Engineering Volume 1 : Principles ’’ , Institute of Physics Publishing Bristol and Philadelphia , pp.102~106.(1995).
20. J Reece Roth , ‘’ Industrial Plasma Engineering Volume 1 : Principles ’’ , Institute of Physics Publishing Bristol and Philadelphia , pp.199.(1995).
21. Liudvikas Pranevicius , ’’ COATING TECHNOLOGY：ION BEAM DEPOSITION ’’ , Satas & Associates , pp.39. (1993).
22. 李正中 , ‘’ 薄膜光學與鍍膜技術 ’’ , 藝軒圖書出版社 , pp.284.(1999).
23. Harold R. Kaufman and Raymond S. Robinson , ‘’ Operation of Broad-Beam Sources ’’ , Commonwealth Scientific Corporation , pp.41.(1987).
24. 李正中 , ‘’ 薄膜光學與鍍膜技術 ’’ , 藝軒圖書出版社 , pp.351~357.(1999).
25. 莊凱評 ,‘’光學薄膜厚度均勻性之研究 ”, 國立中央大學光電科學研究所碩士論文 , p.14(2000)
26. 沈昌翰 ,‘’離子束濺鍍薄膜之物理與光學特性之分析 ”,國立中央大學光電科學研究所碩士論文 , p.22(1995)
27. 莊凱評 , ‘’光學薄膜厚度均勻性之研究’’ , 國立中央大學光電科學研究所碩士論文 , p.14(2000)