本論文研究的主要目標為太陽能應用中光譜分光器的設計，根據光柵繞射分光的特性，配合光阻微顯影技術讓光阻產生一維結構與利用乾性蝕刻產生表面刮除光柵(surface relief)的成型技術，讓太陽光中紅外光波段的能量有效的被光柵繞射，即可達到分光的效果。
　　本論文使用Shipley S1818正光阻，為光阻顯影時常用的材料。根據光的干涉與光阻特性的不同，顯影後獲得的光阻圖案也就不同，曝光時的入射光線角度與顯影時間的多寡都會影響光阻成型，如何掌控參數為此階段的重點。接著利用蝕刻方式讓光柵成型，每個階段的銜接與各個參數的設計便是此論文的研究重點。
　　利用理論推導、軟體模擬和量測證實，此光柵在紅外波段(800~1100nm)的太陽光能量繞射效率達90％，繞射效率峰值的中心波長與模擬誤差大約在10~30nm。
　　在未來，希望將可見光的繞射效率降低至可以應用在太陽能分光上，期望可以讓此種光柵具有更優良的紅外分光效果，提升今後太陽能產業的光電轉換效率。

In this thesis, the main purpose is design for solar application based on Spectrum-Dividing Technology. By using photolithography and dry etching to fabricate the surface relief grating which can make the infrared part of light diffracted from the sun effectively.
In this thesis, we use Shipley S1818 positive photoresist to be materials in our experiment. According to interference of exposure light and characteristic of photoresist, the result of photolithography development could have many possibilities. The angle of incident light during exposure and the time of development can also influence the experiment result. How to control these parameters become the most important thing during this phase. Then we can manufacture the surface relief grating by dry etching. The interactions between each phases and the design of every parameters is the research key in this paper.
Based on theory and simulation by software, the experiment results demonstrate that the average energy of diffraction efficiency in infrared is about 90% and the central wavelength deviation of maximum diffractive efficiency between theoretical values and experiment results is about 10 to 30 nanometers.
In the future, we can make the diffraction of visible light decrease by controlling the parameter to increase the solar conversion efficiency in solar system applications.

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