本論文提出了ㄧ種結合了微光學平台(micro optical bench，MOB)技術的新型光耦合器，稱之為平面式梯度折射率微透鏡(planar gradient-index micro lens)。我們利用現有半導體製程技術，製作矽基平面式微光學元件，應用於雷射二極體-光纖耦合模組，使其具有可批次製造、高對位精準度與高耦合效率之優點。
在設計上，雷射二極體到單模光纖的耦合效率達44.23%。而在元件的製程上，藉由改變電漿輔助化學氣相沈積(PECVD)的N2O/SiH4氣體流量比，成長具有梯度折射率變化的氮氧化矽膜，並利用先進氧化層蝕刻機(AOE)針對氮氧化矽材料進行深乾蝕刻。最後，我們量得雷射二極體到單模光纖耦合效率為5.1%。

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