| 研究生: |
詹智超 Chih-chao Chan |
|---|---|
| 論文名稱: |
反射式電致色變元件之光學常數量測與對比度研究 Investigation of Optical Properties and Contrast Ratio of Reflective Electro-chromic Device |
| 指導教授: |
李正中
Cheng-chung Lee |
| 口試委員: | |
| 學位類別: |
碩士 Master |
| 系所名稱: |
理學院 - 光電科學與工程學系 Department of Optics and Photonics |
| 畢業學年度: | 100 |
| 語文別: | 中文 |
| 論文頁數: | 63 |
| 中文關鍵詞: | 反射式電致色變元件 、對比度 、氧化鎳 、光學常數 、三氧化鎢 、電致色變 |
| 外文關鍵詞: | Contrast Ratio, Optical Properties, NiO, WO3, Reflective Electro-chromic Device |
| 相關次數: | 點閱:10 下載:0 |
| 分享至: |
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電致色變已被研究多年了,但其光學性質在著去色時的變化及狀況之探討並不多,因此進行WO3、Ta2O5、NiO的光學性質n (折射率)及k (消光係數)研究。本研究是以ITO導電玻璃為基板,利用電子槍蒸鍍WO3,以可見光–近紅外光光譜儀以及橢偏儀量測氧化鎢著色前後的狀況,得知氧化鎢著色前後的光學性質n(折射率)及k(消光係數),工作氣壓為2×10-4 Torr時,其△T、△n及△k變化程度最為明顯。
以玻璃為基板,利用電子槍鍍製Ta2O5,考慮n(折射率)與透明度,因此選擇工作氣壓4×10-4Torr當作鍍製整個電致色變元件中離子傳輸層的參數,並利用可見光–近紅外光光譜儀以及橢偏儀量測,得知其光學性質n(折射率)及k(消光係數)。
以ITO導電玻璃為基板,利用電子槍蒸鍍NiO,以可見光–近紅外光光譜儀以及橢偏儀量測氧化鎳著色前後的狀況,得知NiO著色前後的光學性質n(折射率)及k(消光係數),在鍍率為0.6~0.8 nm/s時,其△T、△n及△k變化程度最為明顯。
最後則是利用已知電致色變元件各層薄膜的光學常數:折射率(n)與吸收系數(k),設計出讓電致色變反射式元件在著色狀態能夠達到可見光幾乎無反射的狀態,著去色時的平均反射率之差可高達40%,作為反射式的顯示器時可提高其對比度,達到CR≒21,也提高後視鏡防眩光的效果;最後嘗試以目前所知的光學常數設計出具有色彩變化的電致色變元件。
Electro-chromic device (ECD) has been investigated for many years, but there are few studies on optical properties of ECD between bleached/colored states. Therefore, the refractive indices and extinction coefficients of WO3, Ta2O5 and NiO were measured respectively in the experiment.
The thin films of WO3 were deposited on ITO coated B270 glass substrates by electron beam gun evaporation and the optical properties were measured by visible near-infrared spectrometry and spectrophotometer. The biggest difference of △T,△n and △k was found at oxygen pressure of 2×10-4 Torr.
The thin films of Ta2O5 were deposited on B270 glass substrates by electron beam gun evaporation and the optical properties were measured by visible near-infrared spectrometry and spectrophotometer. Considering the refractive index and transparency, the ion conductor, Ta2O5, of ECD were deposited at oxygen pressure of 4×10-4 Torr.
The thin films of NiO were deposited on ITO coated B270 glass substrates by electron beam gun evaporation and the optical properties were measured by visible near-infrared spectrometry and spectrophotometer. The biggest difference of △T,△n and △k was found at rate of 0.6-0.8 nm/s.
This is study adopted the refractive index and extinction coefficient of WO3, Ta2O5 and NiO which were measured as above mentioned procedures to design nearly zero reflectance of ECD in colored state. The difference of average reflectance reached 40% in bleached/colored state to raise contrast ration of reflective display to 21. In addition, this is designed various color of ECD based on optical properties measured.
[1]. R. Ghosh, M.B. Baker, and R. Lopez, “Optical properties and aging
of gasochromic WO3”, Thin Solid Films, 518, pp.2247~2249, 2010
[2]. Bang K., C. Ottermann, W. Wanger and F. Rauch, in Large-area
Chromogenics: Materials and Devices for Transmittance Control,
edited by C. M. Lampert and C.G. Granqvist (SPIE Opt. Engr. Press,
Bellingham, 1990), Vol. IS4, pp. 122-128
[3]. J.R. Platt, “Electrochromism , A Possible Change of Color Producible in Dyes by
An Electric Field” J.Chem. Phys. 34, 862-86
[4]. S.K Deb, U.S. Patent No.3,521
[5]. 李淑端, “有機固態電解質電致色變元件之製作”, 逢甲大學, 碩士論文,民國
92年
[6]. C. G. Granqvist, Solar Energy Materials & Solar Cells 60 (2000)201-262
[7]. Zahid Hussain, Applied Optics, Vol. 41, No. 31 (1/11/2002)
[8]. R. Ghosh, M.B. Baker, R. Lopez, “Optical properties and aging of gasochromic
WO3
[9]. A. Lusis, Proc. Soc. Photo-Opt Instr. Eng. 2968(1996)167
[10]. K. Kuwabara, M. Yamada, Solid State Ionics 590(1993)25
[11]. G. Vaivars, J. Kleperis. A. Lusis, Solid state Ionics 61(1993)317
[12]. M. A. Macedo. M. A. Aegerter, J. Sol-Gel Sci. Technol. 2(1994)667
[13]. A. Azens, L. Kullman, G. Vaivars, H. Nordborg, C.G. Granqvist, Solid State Ionics 113-115(1998)449
[14]. L. S. Wang, B. P. Hichwa, S.P. Sapers, J. G. H. Mathew, N. A. O’Brien, The Electrochemical Society , Pennington, 95-122(1995)63-75
[15]. J. G. H. Mathew, S. P. Sapers, M. J. Cumbo, N. A. O’Brien, R. B. Sargent, V. P. Raksha, R. B. Lahaderne, B.P. Hichwa, J. Non. Cryst. Solids 218 (1997)342
[16]. P. V. Ashirt, K. Benaissa, G. Bader, F. E. Girouard, V. V. Truong, Solid State Ionics 59 (1993)47
[17]. H. L. Tuller, D. P. Button, D. R. Uhlmann,J. Non-Cryst. Solids 40(1980)93
[18]. G. B. Smith, G. A. Nikllasson, J. S. E. M. Svenson, C. G. Granqvist, J. Appl. Phys. 59(1986)571
[19]. P. V. Ashirt, F. E. Girouard, V. V. Truong, Solid State Ionics 89 (1996)65
[20]. J. Chen, Z. Zhu, Y. Zhou, R. Wang, Y Yan, Proc. Soc. Photo-Opt. Instr. Eng. 2531(1995)161
[21]. R. B. Goldner, F. O. Arntz, T. E. Haas, Solar Energy Mater. Solar Cells 32(1994)421
[22]. R. B. Goldner, F. O. Arntz, K. Dickson, M.A. Goldner, T. E. Haas, T. Y. Liu, S. Slaven, G. Wei, K. K. Wong, P. Zerigian, Solid State Ionics 70/71(1994)613
[23]. R. B. Goldner, F. O. Arntz, K. Dickson, M. A. Goldner, T. E. Haas, T. Y. Liu, S. Slaven, G. Wei, K. K. Wong, P. Zerigian,in:K. C. Ho, D. A. MacArthur(Eds.), Proceedings of the Symposium on Electrochromic Materials II, Vol. 94-2, The Electrochemical Society. Pennington, 1994c, 237-243
[24]. S. F. Cogan, R. D. Rauh, J. D. Klein, N. M. Nguyen, R. B. Jones, T.D. Plante, in:J. B. Bates(Ed.). Proceeding of the Symposium on Thin Solid State Ionic Devices and Materials, Vol. 95-22
[25]. S. F. Cogan, R. D. Rauh, J. D. Klein, N. M. Nguyen, R. B. Jones, T. D. Plante, J. Electrochem. Soc. 144(1997)956
[26]. A. Pennisi, F. Simone, Appl. Phys A 57(1993)13
[27]. A. Pennisi, F. Simone, Proc. Soc. Photo-Opt. Instr. Eng. 2255(1994)206
[28]. A. Pennisi, F. Simone, Solar Energy Master. Solar Cells 39(1995)333
[29]. K. C. Ho, T. G. Rukavina, C. B. Greenberg, J. Electrochem. Soc.141(1994)2061
[30]. K. C. Ho, T. G. Rudavina, C. B. Greenberg, in: K. C. Ho, D. A. MacArthur(Eds.), Proceedings of the Symposium on Electrochromic Materials II, Vol. 94-2, The Electrochemical Society, Pennington, 1994b, 252-268
[31]. K. H. Heckner, A. Rothe, Proc. Photo-Opt. Instr. Eng. 2255(1994)305
[32]. M. Antinucci, A. Ferriolo, Proc. Soc. Photo-Opt. Instrum. Engr. 2255(1994)395
[33]. M. Antinucci, B. Chevalier, A. Ferriolo, Solar Energy Master. Solar Cells 39(1995)271
[34]. F. Michalak, P. Aldebert. Solid State Ionics 85(1996)265
[35]. S. Passerini, A. L. Tipton, W. H. Smyrl, Solar Energy Mater. Solar Cells 39(1995) 167
[36]. R. Lechner, L. K. Thomas, Solar Energy Mater. Solar Cells 54(1998)139
[37]. S. H. Lee, S. K. Joo, Solar Energy Mater. Solar Cells 39(1995)155
[38]. P. Schlotter, G. Baur, R. Schmidt, U. Weinberg, Proc. Soc. Photo-Opt Instr. Eng. 2255(1994)351
[39]. B. Munro, S. Kramer, P. Zapp, H. Krug, H. Schmidt, J. Non-Cryst. Solids 218(1997)185
[40]. B. Munro, P. Conrad, S. Kramer, H. Schmidt, P. Zapp, Solar Energy Mater. Solar Cell 54(1998)
[41]. B. Orel, U. Opara Krasovec, U. Lavrencis Stangar, P. Judeinstein, J. Sol-Gel Sci. Technol. 11(1998)87
[42]. C. G. Granqvist, A. Azens, A. Hjelm, L. Kullman, G. A. Niklasson, D. Ronnow, M. Stromme Mattson, M. Veszelei, G. Vaivars, Solar Energy 63(1998)199
[43]. C. M. Lampert, S. J. Visco, M. M. Doeff, Y. P. Ma, Y. He, J. C. Giron, Proc. Soc. Photo-Opt. Instr. Eng 2017(1993)143
[44]. C. M. Lampert, S. J. Visco, M. M. Doeff, Y. P. Ma, Y. He, J. C. Giron, Solar Energy Mater. Solar Cells 33(1994)91
[45]. S. J. Visco, M. Liu, M. M. Doeff, Y. P. Ma, C. Lampert, Solid state Ionics 60(1993)175
[46]. M. A. De Paoli, A. Zaneli, M. Mastragostino, A. M. Rocco, J. Electroanal. Chem. 435(1997)217
[47]. C.G.GRANQVIST, ”Handbook of inorganic electro-chromic materials”, Elservier, p.4 (1994)
[48]. 謝育忠, 電漿濺鍍電致色變氧化鎳薄膜特性研究與節能評估,中原大學化學工程學系,碩士論文,民國91年
[49]. Armelao, R. Bertncello, C. Grenozzi, G. Depaoli, E. Tondello G. Battoglin and J. Mater. Chem., 4, 3(1994)407-411
[50]. Ozer, Thin Solid Films, 304(1997)310-314
[51]. 王武章,”反應磁控濺鍍氧化鎢薄膜之電致色變性質研究”, 國立成功大學
材料科學及工程學系,碩士論文,民國94年
[52]. B. W. Faughnan, R. S. Crandall, P. M. Heyman, “Electrochromism in WO3 Amoprphous Films” , RCA Resview, Vol 36, p.177-197 (1975)
[53]. Donnadien, Material Science and Engineering, B3, (1989) 185-195
[54]. T. Yoshino, N. Baba, H. Masuda and K. Arai, The Electrochemical Society Softbound Proceedings Series, Pennington, M. K. Carpenter and D. A. Corrigan, Editors, NJ, PV 90-2(1990)89-98
[55]. S.H. Lee, H.M. Cheong, J. G. Zhang, A. Mascarenhas, D. K. Benson, S. K. Deb, “Electrochromic mechanism in a-WO3-y thin films”, Applied Physics Letters, Vol 74, No 2, P.242-244(1999)
[56]. O. F. Schirmer, V. Wittwer, G. Baur, G. Brandt, “Dependence of WO3 Electrochromic Absorption on Crystallinity”, Journal of the Electrochemical
[57]. S. K. Deb, “Optical and Photoelectric Properties and Color Centers in Thin Films of Tungsten Oxide”, Philosophical Magazine, Vol 27, No 4, p.801-822 (1973)
[58]. C. G. Granqvist, “Handbook of Inorganic Electrochromic Materials”, Elsevier, Amsterdam, Lausame, New York, Oxford, Shannon, Tokyo, 1995 p.181
[59]. J. M. Honig, in:S. Trasatti (Ed), Electrodes of Conductive Metallic Oxides, Elsevier, Amsterdam, 1980
[60]. Society, Vol. 124, No.5, p.749-753 (1977)
[61]. K. Bange, “Colouration of tungsten oxide films:A model for optically active coatings”, Solar Energy Materials & Solar Cells, Vol. 58, p.1-131(1999)
[62]. 吳姿蓉,”電子束蒸鍍製備氧化鎳薄膜之電致色變性質研究", 國立成功大學材料科學及工程學系, 碩士論文,民國97年
[63]. WebElementsTM, the periodic table on the http://www.webelementscom/, 1993-2001Mark Winter, The University of Sheffied and WebElements Ltd, UK.
[64]. D. Adler and J. Feinleib, “Band Structure of Magnetic Semiconductors”, Phys. Rev. B2, (1970)3112
[65]. Kwang-Soon Ahn, Yoon-Chae Nah, Jun-Ho Yum and Yung-Eun Sung, “The effect of Ar/O2 Ratio on Electrochromic Response Time of Ni Oxides Grown Using RF Sputtering System”, Jpn.J.Appl. Phys.41(2002) 212-215
[66]. 詹淑靜,”三氧化鎢電色膜層之製作及其電致色變性質之研究”,中央大學,碩士論文,民國89年
[67]. 王宣文,”以電漿表面預處理法在塑膠基板上製鍍抗反射膜”,中央大學,碩士論文,民國94年
[68]. 李正中,”薄膜光學與鍍膜技術”,第五版,台北,藝軒圖書出版社,2006
[69]. 周凌毅,”反應式濺鍍過渡態系薄膜之研究”,中央大學,碩士論文,民國98年
[70]. F.W. Fified and D. Kealey, “Principles and Practice of Analytical Chemistry,”2nd Edition, International Textbook Co Ltd, 1983
[71]. J. A. Thoronton, Ann. Rev.Master. Sci. 7, 239,(1977)
[72]. A. S. Nowick and S.R. Mader, IBM F. Res. Develop.9 , 358, (1965)
[73]. F. F. Ferreira ,M. H. Tabacniks, M. C. A. Fantini, I.C. Faria, A. Gorenstein, “Electrochromic nicdel oxide thin films deposited under different sputtering conditions”, Solid State Ionics 86-88, (1996) 971-976
[74]. D. A. Wruck and M. Rubin, “Structure and Electronic Properties of Eletrochromic NiO Films”, J. Electrochem. Soc., Vol. 140, No. 4, (1993)1097-1104
[75]. Bange K., C.Ottermann, W. Wanger and F. Rauch, in Large-area Chromogenics:Materials and Devices for Transmittance Control, edited by C.M. Lampert and C.G. Granqvist (SPIE Opt. Engr. Press, Bellingham, 1990), Vol. IS4, pp.122-128