奈米科技的發展將是二十一世紀的主流技術，其中微奈米圖案成像技術，亦將隨著各種功能元件的需求而朝更快速發展。微製造技術難度與日俱增，其中關鍵就是光學微影方法中，由於光繞射的現象而不易得到奈米級解析度圖形，同時大部分光學微影方法之奈米圖案成像技術的光源設備均極為昂貴。因此一個具高解析度之奈米級尺寸，又具有方便且不會昂貴的製程，為半導體製程未來重要技術。因此本論文提出以電濕式 (electrowetting on dielectric, EWOD) 驅動系統與奈米球微影術 (Nanosphere Lithography, NSL) 相結合，並運用軟蝕刻微影 (Soft Lithography) 與自組裝分子膜 (Self-Assembled Monolayer, SAM) 兩種方式，製作出微奈米級之圖樣。

Nanotechnology has become as the mainstream technology in the twenty-first century. Especially, the micro/nano patterning technology is also under rapid development to the needs of the various functional elements. However, the micro-fabrication technology, which is critical lithography for pattern transferring, is getting more difficult. In optic lithography, the diffraction makes it not easy to obtain the patterns with the fine structures in the nanometer scale. Moreover, the light sources for optical lithography are extremely expensive. Therefore, it is an urgent and interesting subject to develop a new process of high resolution in micro/nano-scale but convenient to implement and not expensive in cost. In this thesis, it is proposed to integrate the electrowetting on dielectric (EWOD) actuation and the nanosphere lithography (NSL). Finally, the application of practical fabrication has also been demonstrated with aids of the soft lithography and the self-assembled monolayer (SAM).

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