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研究生： 潘俊豪
Chun-Hai Pan
論文名稱： 刻紋後之酸鹼洗潔淨製程對磁記錄媒體之異向性及磁記錄性質之影響研究
The effects of cleaning process to the magnetic recording media on OR and magnetic recording properties.
指導教授： 李勝隆
Sheng-Long Lee
口試委員:
學位類別： 碩士
Master
系所名稱： 工學院 - 機械工程學系
Department of Mechanical Engineering
畢業學年度： 91
語文別： 中文
論文頁數： 55
中文關鍵詞： 鎳磷 、異向性 、訊號雜訊比 、磁性薄膜 、硬碟片刻紋製程 、磁性材料 、磁記錄
外文關鍵詞： cleaning, texture, SNR, magnetic recording, orientation ratio, media noise, dc noise, signal, NiP
相關次數： 點閱：9  下載：0 
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    • 形成異向性媒體的機制中，刻紋製程及後續形成Cr(200)/Co(11.0)磊晶系統是不可或缺的兩項條件。本論文針對刻紋後續之酸鹼洗潔淨過程中雙氧水的添加與否，研究刻紋形態及結晶結構所受的影響。實驗結果顯示雙氧水的添加會造成鎳磷層表面氧化差異及刻紋形態的改變，因而降低橫向磁記錄媒體的異向性。
    隨著異向性的降低，伴隨而來的影響是磁記錄性質的表現不佳。由於雙氧水的添加，使得訊號強度(LF)、訊號半高寬(PW50)、頻譜訊號雜訊比(SpectralSNR)等性質表現不佳。其中又以訊號雜訊比差異最為明顯。藉由各種訊號雜訊之分析比較，進一步釐清造成訊號雜訊比表現不佳的因素中，又以抹除訊號後之雜訊表現(Ndc)差異最為明顯。

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    摘要……………………………………………………………………….I 總目錄…………………………………………………………………II 圖目錄…………………………………………………………………V 表目錄…………………………………………………………………VII 第一章、 前言…………………………………………………………1 第二章、 基本原理與文獻回顧………………………………………4 2-1. 磁記錄原理…………………………………………………………4 2-1-1.磁頭介紹………………………………………………………..4 2-1-1-1感應式磁頭(inductive head)…………………………………4 2-1-1-2磁阻式磁頭(magneto-resistance head, MR head)…………..6 2-1-2.磁記錄媒體基本架構…………………………………………..6 2-1-3.磁矩轉換區域(magnetization transition)……………………..9 2-2. 磁記錄性能的優劣判定…………………………………………11 2-2-1.等寬度記錄位元……………………………………………13 2-2-2.訊號與雜訊……………………………………………………13 2-2-3.反磁化場效應…………………………………………………16 2-3. 磁記錄媒體之架構與磁記錄性能之關係………………………..18 2-3-1.鎳磷層之性質…………………………………………………18 2-3-2.異向性磁記錄媒體之性質-OR……………………………….18 2-3-3.磁性層平均晶粒尺寸…………………………………………19 2-4. 表面粗糙度之表示………………………………………………..20 2-4-1.中心線平均粗糙度 (Ra)………………………………………20 2-4-2.最大粗糙度 (Rmax)……………………………………………20 第三章、 分析儀器介紹……………………………………………..22 3-1.樣品震盪磁性量測儀(Vibration sample magnetometer, VSM)...22 3-2.X光繞射儀(X-ray diffractometer, XRD)…………………………24 3-3.掃描試探針顯微鏡…………………………………………………25 3-3-1.原子力顯微鏡(Atomic force microscope, AFM)……………25 3-3-2.磁力顯微鏡(Magnetic force microscope, MFM)……………25 3-4.X光光電子譜儀(X-ray photoelectron spectrometer, XPS)……..26 3-5.讀寫分析儀(Read-write analyzer, RWA)…………………………26 第四章、 實驗方法與步驟…………………………………………..28 4-1. 磁記錄媒體之準備………………………………………………..28 4-1-1.基板的準備及酸鹼洗條件……………………………………28 4-1-2.鍍膜之程序與條件……………………………………………30 4-2. 記錄媒體之性質分析……………………………………………..30 第五章、 實驗結果與討論…………………………………………..33 5-1.酸鹼洗製程對OR (Orientation Ratio)的影響…………………...33 5-1-1.酸鹼洗製程差異………………………………………………34 5-1-2.鎳磷層表面氧化差異…………………………………………34 5-1-3.刻紋形態比較…………………………………………………36 5-1-4.結晶結構比較…………………………………………………39 5-1-5.記錄媒體異向性的比較………………………………………39 5-2.酸鹼洗製程對紀錄媒體磁紀錄性質的影響………………………41 5-2-1.訊號半高寬(PW50)、訊號雜訊比(SNR)…………………….41 5-2-2.不同線記錄密度下訊號與各種雜訊之分析…………………44 第六章、 結論……………………………………………………….52 第七章、 參考文獻…………………………………………………..53

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