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研究生: 呂玲瑄
Ling-Xuan Lu
論文名稱: 吡啶硫醇分子及其衍生物在金(111)上的吸附及其對銅沉積的影響
指導教授: 姚學麟
口試委員:
學位類別: 碩士
Master
系所名稱: 理學院 - 化學學系
Department of Chemistry
論文出版年: 2025
畢業學年度: 113
語文別: 中文
論文頁數: 151
中文關鍵詞: 電化學硫醇分子電鍍銅
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  • 關於有機硫醇分子在自組裝分子膜(Self-assembled monolayer)領域的研究備受關注,近年來更是專注於雜環硫醇分子的應用,而其作為電鍍銅時的有機添加劑也同樣備受重視。吡啶(Pyridine)官能基的有機硫化物被廣泛研究,目前研究表明吡啶硫醇分子可應用於促進細胞色素C的電子轉移、沉澱廢水中的重金屬、溶解金屬金以及抑制銅溶解,然而它們在界面電化學的吸附狀態及型式尚未被充分探討。本研究第一部分透過循環伏安法(CV)以及掃描式穿隧電子顯微鏡(STM),探討了2-巰基吡啶2-MPY (2-Mercaptopyridine)、2-巰基吡啶-3-羧酸2-MPYA (2-Mercaptopyridine-3-carboxylic acid)分子在金(111)電極上的吸附行為,並將結果與MMI (2-Mercapto-1-methylimidazole)、4-MPY (4-Mercaptopyridine)做比較,接著透過改變電位控制、pH值、陰離子、製備溶液的影響觀察分子在金(111)表面上的變化。結果闡明2-MPY/H2O、2-MPY/EtOH分子在pH1 硫酸、pH3 硫酸鉀、0.1 M 過氯酸中在正電位0.3 V至0.9 V之間皆可觀察到穩定的分子結構,證明結構具有相當好的穩定度,並不會受到溶劑的影響。透過高解析的STM影像圖分析2-MPY/H2O、2-MPY/EtOH、MPYA分子吸附方式。觀察到分子吸附期間並未觀察到典型硫醇分子所形成的S-Au-S結構,以及其所造成的缺陷,分子皆以S、N直接吸附於金 (111)表面上,而這樣的結果與本研究所選用的分子結構和金表面形成的鍵結有關。MPYA分子在pH1 硫酸中在正電位0.3 V至0.9 V之間皆可觀察到穩定的分子結構,證明結構亦具有相當好的穩定度。透過高解析的STM影像圖分析2-MPY/H2O、MPYA分子吸附方式一致,分子皆以S、N直接吸附於金 (111)表面上,但其中MPYA具有羧酸基(COOH),其形成的氫鍵會使結構更穩定。本研究的第二部分則揭示了2-MPY、2-MPYA分子作為電鍍銅的添加劑的效果。兩結構差異在於是否具有羧酸基(COOH),實驗證實2-MPY有顯著的抑制效果,而2-MPYA則有良好的加速效果(加速約3-4倍)。結果證實,本實驗對於2-MPY、2-MPYA的研究,有助於了解吡啶硫醇分子自組裝過程中的吸附機制,並在電鍍銅上有不錯的貢獻,希望未來可以有更多的應用。


    Research on organic thiol molecules in the field of self-assembled monolayers (SAMs) has attracted significant attention, particularly the recent focus on heterocyclic thiol derivatives. These compounds have also garnered interest as organic additives in copper electroplating processes. Pyridine-functionalized organosulfur compounds have been extensively studied, and current findings indicate that pyridine-thiol molecules can promote electron transfer in cytochrome C, precipitate heavy metals from wastewater, dissolve gold, and inhibit copper dissolution. However, their adsorption states and configurations at electrochemical interfaces remain insufficiently understood.In the first part of this study, the adsorption behavior of 2-mercaptopyridine (2-MPY) and 2-mercaptopyridine-3-carboxylic acid (2-MPYA) on Au(111) electrodes was investigated using cyclic voltammetry (CV) and scanning tunneling microscopy (STM). Their behavior was compared to that of 2-mercapto-1-methylimidazole (MMI) and 4-mercaptopyridine (4-MPY). The effects of applied potential, pH, anions, and solvent environment on molecular arrangement were also examined.The results revealed that 2-MPY in both water and ethanol forms stable monolayers in pH 1 H₂SO₄, pH 3 K₂SO₄, and 0.1 M HClO₄ across a potential range of +0.3 V to +0.9 V, demonstrating excellent stability regardless of solvent. High-resolution STM images showed no typical S–Au–S thiolate structures or associated defects; instead, the molecules were found to adsorb directly via S and N atoms on the Au(111) surface—an outcome attributed to the specific molecular structures and binding modes involved.Similarly, MPYA formed stable structures in pH 1 H₂SO₄ within the same potential range, also confirmed through STM imaging to adsorb via S and N atoms. The presence of a carboxylic acid group (-COOH) in MPYA likely contributes to additional hydrogen bonding, further stabilizing the SAM structure.The second part of this study evaluated the performance of 2-MPY and 2-MPYA as additives in copper electroplating. The key structural difference lies in the presence of the –COOH group. Experimental data revealed that 2-MPY exhibited a strong suppressing effect, whereas 2-MPYA significantly accelerated the plating process by approximately 3–4 times.In conclusion, this study provides insights into the adsorption mechanisms of pyridine-thiol SAMs on gold surfaces and demonstrates their potential application as functional additives in copper electroplating, offering promising directions for future development.

    中文摘要 I ABSTRACT III 誌謝 V 圖目錄 X 表目錄 XVIII 第一章、緒論 1 1.1 自組裝單分子膜 1 1.1.1. 自組裝分子模發展 1 1.1.2. 自組裝分子模原理 1 1.1.3. 吡啶硫醇分子 3 1.2 超填空電鍍 5 1.2.1 電鍍銅填孔技術發展 5 1.2.2 超填孔電鍍添加劑種類及作用原理 7 第二章、實驗部分 9 2.1 藥品 9 2.2 分子結構圖 10 2.3 氣體與線材 11 2.4 儀器設備 12 2.4.1 循環伏安儀(Cyclic Voltammetry, CV) 12 2.4.2 掃描式穿隧電子顯微鏡(Scanning Tunneling Microscopy, STM) 13 2.4.3 超音波振盪器(Ultrasonic cleaner) 14 2.4.4 研磨拋光機(Grinder and Polisher) 14 2.5 實驗步驟 15 2.5.1 金(111)單晶電極製備(使用於CV實驗) 15 2.5.2 金(111)單晶電極製備(使用於STM實驗) 15 2.5.3 STM探針製備 16 2.5.4 循環伏安法(CV)實驗前處理 16 2.5.5 掃描式穿隧電子顯微鏡(STM)實驗前處理 16 第三章、2-MPY在金(111)電極上的吸附 18 3.1 電位控制對2-MPY/H2O吸附結構的影響 18 3.1.1 pH1硫酸溶液中不同濃度2-MPY/H2O於金(111)上的CV圖 18 3.1.2 不同濃度2-MPY/H2O修飾於金(111)上的覆蓋度 22 3.1.3 pH1硫酸溶液中浸泡60秒50µM 2-MPY/H2O在金(111)上的STM圖 24 3.1.4 pH1硫酸溶液中浸泡60秒1000µM 2-MPY/H2O在金(111)上的STM圖 29 3.2 PH值及陰離子對2-MPY/H2O吸附結構的影響 31 3.2.1 pH3硫酸鉀溶液中2-MPY/H2O於金(111)上的CV圖 31 3.2.2 pH3硫酸鉀溶液中2-MPY/H2O在金(111)上的STM圖 34 3.2.3 0.1M 過氯酸溶液中2-MPY/H2O在金(111)上的CV圖 39 3.2.4 0.1M 過氯酸溶液中2-MPY/H2O在金(111)上的STM圖 41 3.3 製備條件對2-MPY吸附結構的影響 46 3.3.1 pH1硫酸溶液中2-MPY/EtOH於金(111)上的CV圖 46 3.3.2 2-MPY/EtOH修飾於金(111)上的覆蓋度 49 3.3.3 pH1硫酸溶液中2-MPY/EtOH在金(111)上的STM圖 50 3.4 PH值及陰離子對2-MPY/ETOH吸附結構的影響 57 3.4.1 pH3硫酸鉀溶液中2-MPY/EtOH於金(111)上的CV圖 57 3.4.2 pH3硫酸鉀溶液中2-MPY/EtOH於金(111)上的STM圖 59 3.4.3 0.1M過氯酸溶液中2-MPY/EtOH於金(111)上的CV圖 64 3.4.4 0.1M過氯酸溶液中2-MPY/EtOH於金(111)上的STM圖 66 3.5 結論 71 第四章、2-MPYA在金(111)電極上的吸附 73 4.1 電位控制對2-MPYA吸附結構的影響 73 4.1.1 pH1硫酸溶液中2-MPYA於金(111)上的CV圖 73 4.1.2 pH1硫酸溶液中2-MPYA於金(111)上的STM圖 77 4.2 PH值及陰離子對2-MPY吸附結構的影響 81 4.2.1 pH3硫酸鉀溶液中2-MPYA於金(111)上的CV圖 81 4.2.2 pH3硫酸鉀溶液中2-MPYA於金(111)上的STM圖 83 4.2.3 pH7硫酸鉀溶液中2-MPYA於金(111)上的CV圖 85 4.2.4 pH7硫酸鉀溶液中2-MPYA於金(111)上的STM圖 87 4.2.5 0.1M 過氯酸溶液中2-MPYA在金(111)上的CV圖 89 4.2.6 0.1M 過氯酸溶液中2-MPYA在金(111)上的STM圖 90 4.3 結論 93 第五章、探討2-MPY/2-MPYA分子對銅沉積的影響 94 5.1 PH1硫酸溶液中銅的沉積 94 5.1.1 pH1硫酸溶液中銅沉積CV圖 94 5.1.2 pH1硫酸溶液中銅沉積STM圖 96 5.2 PH1硫酸溶液中2-MPY/2-MPYA對銅沉積的影響 98 5.2.1 pH1硫酸溶液中2-MPY銅沉積CV圖 98 5.2.2 pH1硫酸溶液中2-MPY銅沉積STM圖 102 5.2.3 pH1硫酸溶液中2-MPYA銅沉積CV圖 105 5.2.4 pH1硫酸溶液中2-MPYA銅沉積STM圖 109 5.3 PH值對2-MPY/2-MPYA銅沉積的影響 112 5.3.1 PH3硫酸鉀溶液中2-MPY銅沉積CV圖 112 5.3.2 pH3硫酸鉀溶液中2-MPYA銅沉積CV圖 115 5.4 比較不同因素及分子對的銅沉積 118 5.4.1 不同pH值比較觀察添加常見抑制劑對銅沉積影響CV圖 118 5.4.2 比較不同有機添加劑對銅沉積影響CV圖 121 5.5 結論 124 第六章、結論 125 第七章、參考資料 127

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