在本論文中，我們運用二氧化矽與非晶向矽(amorphous silicon, a-Si)、二氧化矽(silicon dioxide, SiO2)與氮化矽(silicon nitride, Si3N4)兩種不同結構所組成的高反射之布拉格反射鏡(Bragg reflectors)，設計並製作中空光波導。設計過程中，我們將會利用能帶結構(band structure)與傳遞矩陣法(transfer matrix method)設計出膜層結構。設計中空波導後，我們將設計出兩種膜層結構組合而成的中空波導之轉角波導，並利用二維有限時域差分法(two-dimensional finite-difference time-domain method, 2-D FDTD)模擬彎角式中空光波導(angled hollow waveguides)及截角式中空光波導(cut-type 90o-hollow waveguides)。論文中，我們將會介紹波導的製作過程及其量測結果。

In this study, we design and fabricate hollow waveguides by the Bragg reflectors. Moreover, we utilize two types of multilayer structures including silicon dioxide/amorphous silicon (SiO2/Si) and silicon dioxide/silicon nitride (SiO2/Si3N4) to form the Bragg reflectors. We design multilayer structures by the transfer matrix method. We design the bent hollow waveguides with two types of multilayer structures by using the two-dimensional finite-difference time-domain method (2-D FDTD) to simulate bent hollow waveguides with different bending designs. In the end, we introduce the fabrication process and measurement results.

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