本篇論文使用奈米壓印技術製作公分等級的奈微米元件，旨在取代電子束微影及傳統曝光機的方式，以達到製作公分等級元件及大量生產的目的。奈米壓印技術相較於傳統方法，具備低成本、效率高及製作快速的優勢。實驗中，我們成功使用了熱壓成型奈米壓印和光固化奈米壓印兩種技術，製作出公分等級的光柵元件。這些光柵元件主要應用於光導中的擴瞳功能。此外，我們利用嚴格耦合波分析法（Rigorous coupled-wave analysis，RCWA）對光柵的繞射效率進行模擬，並將模擬結果與實際測量結果進行比較。結果顯示，模擬結果與量測結果的誤差小於5%，證明了我們製作的光柵元件在光學性能上的高一致性和可靠性。這一研究成果展示了奈米壓印技術在製作高精度、大面積光學元件方面的巨大潛力，並為未來的光學元件製造提供了一條高效、可行的技術路徑。本研究的成功不僅為光導元件的製造提供了新的解決方案，也為擴展奈米壓印技術在其他光學和電子元件中的應用奠定了基礎。未來，我們將進一步優化壓印工藝，提升元件性能，以滿足更多應用需求。

This thesis employs nanoimprint lithography (NIL) to fabricate centimeter-scale nanometer components, aiming to replace electron beam lithography and traditional exposure machines for producing centimeter-scale devices and achieving mass production. Compared to traditional methods, nanoimprint lithography offers advantages such as low cost, high efficiency, and rapid fabrication. In our experiments, we successfully used both thermal nanoimprint and UV-curable nanoimprint techniques to create centimeter-scale grating elements. These grating elements are mainly used for pupil expansion functions in light guides. Additionally, we employed rigorous coupled-wave analysis (RCWA) to simulate the diffraction efficiency of the gratings and compared the simulation results with actual measurements. The results showed that the error between the simulation and measurement was less than 5%, demonstrating the high consistency and reliability of the optical performance of our fabricated grating elements. This research highlights the significant potential of nanoimprint lithography in producing high-precision, large-area optical components and provides an efficient and feasible technical pathway for future optical component manufacturing. The success of this study not only offers a new solution for the production of light guide components but also lays the foundation for extending nanoimprint lithography applications to other optical and electronic components. In the future, we will further optimize the imprinting process to enhance component performance to meet more application needs.

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