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研究生: 蔡宗典
Tsung-tien Tsai
論文名稱: 超薄ITO透明導電膜應用在觸控面板之研究
Reliability and Stability in Electrical Properties of Ultra-thin ITO for Touch Panel Application
指導教授: 李正中
Cheng-Chung Lee
口試委員:
學位類別: 碩士
Master
系所名稱: 理學院 - 光電科學研究所碩士在職專班
Executive Master of Optics and Photonics
畢業學年度: 96
語文別: 中文
論文頁數: 53
中文關鍵詞: 觸控面板氧化銦錫濺鍍
外文關鍵詞: sputter coating, Touch Panel, Indium Tin Oxide
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  • 本文使用直流磁控濺鍍在玻璃基板表面沉積ITO透明導電膜,研究超薄的ITO膜厚從2nm到100nm的電阻率、穿透率、微觀結構、表面粗糙度等薄膜特性,以及探討在觸控面板上的環境耐久性與ITO鍍膜製程的關係。
    氧化銦錫(ITO)在可見光區擁有高穿透率以及低電阻率的透明導電膜,通常應用在平面顯示器的電阻率約2E-4Ωcm。但是應用在觸控面板的透明導電膜需要較高的電阻率(常見的面阻抗約300 ~1000Ω),為了得到較高的面電阻,透明導電膜的膜厚需要變得很薄,而膜厚太薄的薄膜會產生許多問題,包括電性的不穩定、面阻抗的不均勻、環境測試能力變差,本論文即要探討研究此改善方向,先針對ITO膜厚對於其結構與光電特性之研究,並且透過調整反應氣體O2的含量以及濺鍍功率密度來改善ITO薄膜特性,以符合觸控面板的透明導電膜之要求。
    實驗結果可知,ITO薄膜在膜厚為8nm、濺鍍功率密度為0.38 w/cm2、氧氣含量2.6%,可達到穿透率大於91%,面阻抗值為500Ω/□之ITO導電玻璃,並可符合觸控面板所要求的耐高溫測驗(160℃,30分鐘)、恆溫恆濕測驗(60℃,90%相對濕度,240小時)、以及耐鹼測驗(NaOH 5%,10分鐘)。


    This study uses DC magnetron sputtering to deposit indium tin oxide(ITO) thin film on a soda-lime glass surface to study thin-film properties of an ultra-thin ITO that have a thin-film thickness of 2nm-100nm,Resistivity, transmittance, thin-film structure morphology and surface roughness were determined. This study also examines the relationship between ITO coating processes and reliability testing.
    Indium tin oxide is a transparent conducting thin film that has a highly visible transmission and low resistivity. In Flat Panel Display applications, ITO resistivity is typically 2E-4Ωcm. However, in the touch panel applications, the transparent conductivity oxide (TCO) film requires high resistivity (sheet resistance is approximately 300-1000Ω). To increase sheet resistance, the TCO film should be thin; however, this has many disadvantages, including unstable electrical properties, non-uniform sheet resistance, and poor reliability and durability. This study attempts overcome these problems. This study investigated the effects of various ITO thicknesses on thin-film structure and photoelectric properties, and then fine tuned optimal oxygen gas flow and deposition power density to improve ITO thin-film properties, such that they meet touch panel requirements.
    Experiments results demonstrate that an ITO thickness of 8nm was deposited using a coating process with a power density of 0.38 w/cm2 and oxygen gas flow of 2.6%, that has 91% transmittance and a sheet resistance of 500Ω/□, the ITO thin film also passed all reliability tests, including heat testing (160℃, 30 mins), humidity testing (60℃, 90%RH, 240hrs) and alkaline testing (NaOH 5%, 10mins).

    摘要 I Abstract II 目錄 III 圖目錄 VI 表目錄 VIII 第一章 緒論 1 1-1研究動機與目的 1 1-2 文獻回顧 2 第二章 基本理論 5 2-1氧化銦錫(ITO)透明導電膜之特性 5 2-1-1 簡介 5 2-1-2 電性 6 2-1-3 光學特性 8 2-2磁控濺鍍機制 11 2-2-1 濺鍍原理 11 2-2-2 直流輝光放電 11 2-2-3 磁控濺鍍 14 2-3薄膜成長 15 2-3-1 薄膜成長過程 15 2-3-2 薄膜之微結構 17 2-4觸控式螢幕種類 18 2-4-1 電阻式 19 2-4-2 電容式 21 2-4-3 波動式 22 第三章 實驗儀器與架構 24 3-1濺鍍系統 24 3-2量測系統 27 3-2-1 面電阻量測 27 3-2-2 光譜儀 27 3-2-3 橢圓儀 28 3-2-4 原子力顯微鏡(AFM) 28 3-2-5 掃瞄式電子顯微鏡(SEM) 29 3-2-6 能量散佈光譜儀(EDX) 30 3-2-7 環境測試機台 30 第四章 實驗結果與分析 31 4-1 ITO膜厚與電阻率的關係 31 4-2 ITO膜厚與穿透率的關係 32 4-3 不同膜厚的ITO薄膜表面特徵 34 4-4 不同ITO膜厚之元素分析 37 4-5 不同ITO膜厚之表面粗糙度比較 38 4-6 ITO膜厚與環境測試的結果 39 4-7 氧氣的影響 41 4-8 濺鍍功率密度的影響 45 第五章 結論 46 Conclusion 49 參考文獻 50

    [1] M.Bender, W.Seelig, C.Daube, H.Frankenberger, B.Ocker, J.Stollenwerk “ Dependence of oxygen flow on optical and electrical properties of DC-magnetron”, Thin solid Films 326.72-77, 1998.
    [2] C.Choi., W.J. Lee, J.K., S.O. Jung, W.J. Lee, W.S. Kim, S.J. Kim, C. Yoon“ Effects of oxygen partial pressure on the microstructure and electrical properties of indium tin oxide film prepared by d.c. magnetron sputtering”, Thin solid Films 258.274-278, 1995.
    [3] A.N.H. Al-Ajili, S.C. Bayliss“ A study of the optical, electrical and structural properties of reactively sputtered InOx and ITOx thin films”, Thin solid Films 305, 116-123, 1997.
    [4] S. K. Choi and J. I. Lee “Effect of film density on electrical properties of indium tin oxide films deposited by dc magnetron reactive sputtering”, J. Vac. Sci. Technol. A, Vol. 19, 2043-2047, 2001.
    [5] W. De Bosscher, H. Delrue, J. VanHolsbeke, S. Matthews, and A. Blondeel “Rotating Cylindrical ITO Targets for Large Area Coating”, 2005 Society of Vacuum Coaters ,48th Annual Technical Conference Proceedings, 111-115,2005.
    [6] W.-M. Gnehr, U. Hartung, T. Kopte “Pulsed Plasmas for Reactive Deposition of ITO Layers”, 2005 Society of Vacuum Coaters, 48th Annual Technical Conference Proceedings, 312-316,2005.
    [7] M. Bender, J. Trube, J. Stollenwerk “Deposition of transparent and conducting indium tin oxide films by the r.f.-superimposed DC sputtering technology”, Thin solid films 354 .100-105, 1999.
    [8] D.R. Gibson, I.T. Brinkley, G.H. Hall, E.M. Waddell and J.M. Walls “Properties of indium tin oxide deposited using reactive closed field magnetron sputtering”, 2006 Society of Vacuum Coaters, 49th Annual Technical Conference Proceedings, 2006.
    [9] C. May, J. StruÈmpfel “ITO coating by reactive magnetron sputtering-comparison of properties from DC and MF processing”, Thin solid films 351, 48-52, 1999.
    [10] R.N.Joshi, V.P.Singh, J.C. McClure “ Characteristics of indium tin oxide films deposited by r.f. magnetron sputtering”, Thin solid Films 257, 32-35, 1995.
    [11] P.F. Carcia, R.S. McLean, M.H. Reilly, and Z.G. Li “Resistivity and Microstructure Issues in Indium-Oxide Based Films Grown by RF Magnetron Sputtering on Flexible Polyester Substrates”, Society of Vacuum Coaters ,46th Annual Technical Conference Proceedings, 195-199,2003
    [12] J.L. Grieser “Comparison of ITO Films Produced by Standard D.C. Sputtering and Ion Beam Assisted Sputtering”, 1995 Society of Vacuum Coaters, 38th Annual Technical Conference Proceedings, 155-162,1995
    [13] X. W. Sun, D. H. Kim, and H. S. Kwok “ULTRA THIN INDIUM TIN OXIDE FILMS ON VARIOUS SUBSTRATES BY PULSED LASER DEPOSITION” Hong Kong Research Grants Council.1997
    [14] V. Craciun, D. Craciun, X. Wang, T. J. Anderson, R. K. Singh “ Transparent and conducting indium tin oxide thin films grown by pulsed laser deposition at low temperatures”, Journal of Optoelectronics and Advanced Materials Vol. 5, No. 2, 401-408, 2003.
    [15] A.Amaral, P.Brogueira, C.Nunes de Carvalho, G.Lavareda“Influence of the initial layers on the optical and electrical properties of ITO films” Optical Materials 17, 291-294, 2001.
    [16] Y.S. Jung, D.W. Lee, D.Y. Jeon “Influence of dc magnetron sputtering parameters on surface morphology of indium tin oxide thin films”, Applied Surface Science 221, 136–142 ,2004
    [17] A. Salehi “The effects of deposition rate and substrate temperature of ITO thin films on electrical and optical properties”, Thin Solid Films 324,214–218,1998.
    [18] A. Amaral, P. Brogueira, C. Nunes de Carvalho, G. Lavareda “Early stage growth structure of indium tin oxide thin films deposited by reactive thermal evaporation”, Surface and Coatings Technology 125,151–156,2000.
    [19] T.asikainen, M.Ritala, M.Leskela, T.Prohaska, G.Friedbacher ,M.Grasserbauer “AFM and STM studies on In2O3 and ITO thin film deposited by atomic layer epitaxy”, Applied Surface Science 99,91-98,1996.
    [20] X. W. Sun, H. C. Huang, and H. S. Kwok“On the initial growth of indium tin oxide on glass” Appl. Phys. Lett. 68 (19), 2663-2665, 1996
    [21] Y.Han, D.Kim, J.Cho, Y.Beag, S.Koh “Study of the substrate treatment effect on initial growth of indium tin-oxide films on polymer substrate using in situ conductance measurement”, Thin solid Films 496, 58-63, 2006.
    [22] G.Mei-Zhen, J.R, X.De-Sheng, F.W “Thickness Dependence of Resistivity and Optical Reflectance of ITO Films” Chinese Phys. Lett. 25, 1380-1383, 2008.
    [23] D.R. Cairns, D.C. Paine, and G.P. Crawford “The Mechanical Reliability of Sputter Coated Indium Tin Oxide Polyester Substrates for Flexible Display and Touch screen Applications”, 2001 Society of Vacuum Coaters ,44th Annual Technical Conference Proceedings, 160-165,2001.
    [24] E. Yadin, V. Kozlov, and E. Machevskis “Recent Developments in the Deposition of ITO and AR Coatings”, 2003 Society of Vacuum Coaters ,46th Annual Technical Conference Proceedings, 185-189, 2003
    [25] T.Minami, H.Sonohara, T.Kakumu, S.Takata“ Physics of very thin ITO conducting films with high transparency prepared by DC magnetron sputtering”, Thin solid Films 270, 37-42, 1995.
    [26] J. Matthijn Dekkers, Guus Rijnders, and Dave H. A. Blank “Role of Sn doping in In2O3 thin films on polymer substrates by pulsed-laser deposition at room temperature”, APPLIED PHYSICS LETTERS 88, 2006.
    [27] K.UTSUMI, H.IIGUSA “The Effect of SnO2 Concentration on the Electrical and Optical Properties of In2O3-SnO2 Films”, TOSOH Research & Technology Review Vol.47, 2003
    [28] S.Takahashi, M.Ikeda, H.Watnabe “Sputtering target for forming high-resistance transparent conductive film, and method for producing the film”, United States Patent US 2004/0231981 A1, Nov.25, 2004.
    [29] C.Weeks “Carbon nanotube transparent electrodes for touch screens”, Veritas et Visus, Touch Panel, 34-37,Oct,2006.
    [30] I. Elfallal, R. D. Rilkington, A. E. Hill.“ Formation of a statistical thermodynamic model for the electron concentration in heavily doped metal oxide semiconductors applied to the tin-doped indium oxide system”, Thin solid films v223, 303-310, 1993.
    [31] 李正中, 薄膜光學與鍍膜技術(第四版), P44-P48, 2004
    [32] J.A. Thornton, Ann.Rev.Mater.Sci. 7, 239,1977.
    [33] F.C .Matacotta and G.Ottaviani “ Science and technology of thin film “ World Scientific Publishing Co.Pte.Ltd QC176,83,S25, 1995.
    [34]. A.J. Steckl and G. Mohammed, “The Effect of Ambient Atmosphere in the Annealing of Indium Tin Oxides Films”, J. Appl. Phys.,51(7), 3890-3895.1980.
    [35]. M. Quaas,C. Eggsl , H. Wulff, “Structural studies of ITO thin films the Rietveld method”, Thin Solid Films 332, 277-281,1998.
    [36]. H.L Hartangel, A.L. Dawar, A.K. Jain, and C. Jagadish,Semiconducting Transparent Thin Films (Institute of Physics,Philiadelphia, 219-230,1995.
    [37] J. Venables, “Nucleation and Growth of Thin films”, Rep. Prog. Phys.,47, 399, 1984.
    [38] J.A.Thornton, “Influence of Apparatus Geometry and Deposition conditions on the Structure and Topography of Thick Sputtered Coatings”, J. Vac. Sci. Technol. 11(4), 666, 1974.

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