本論文提出一套操作步驟較為簡潔的新式全像形變量測技術：「光致變色式全像干涉術形變量測系統」。研究中我們以全像拍攝的方式量測高反射率鏡面物體與低反射率粗糙物體的形變，將變化前後之波前資訊以紫光雷射(405 nm)記錄於光致變色材料上。其中高反射率鏡面物體形變量測實驗的條紋靈敏度為362.3 nm/條，而低反射率粗糙物體形變量測實驗的條紋靈敏度為1.029 μm/條。有別於傳統的部分是其不需要將記錄媒體取下進行顯影、定影、清洗、風乾等繁瑣步驟，曝光後即可直接重建出物體影像，此外遮蔽光源後即可洗去全像光柵，每次量測完成，不需要更換記錄媒體，可以重複使用。

We proposed a simpler and newer deformation measurement system by photochromic material-based holographic interferometry. In this research, we measured deformation from high reflectivity object and low reflectivity object, the wave information recorded on photochromic material by purple laser (405 nm). The sensitivity is 362.3 nm in the high reflectivity object deformation measurement experiment, and the sensitivity is 1.029 μm in the low reflectivity object deformation measurement experiment. Different from tradition, the process is no need to remove the photochromic material to development, fixing, cleaning, air drying and any other steps, it can directly reconstruct the object image after exposure. In addition, the holographic grating can be erased after shielding the light source. Every time we completed the measurement, there is no need to change the recording media. It can be reused.

[1]. A. K. Sinha, H. J. Levinstein, and T. E. Smith, "Thermal stresses and cracking resistance of dielectric films (SiN, Si3N4, and SiO2) on Si substrates," J. Appl. Phys 49, 2423-2426 (1978).
[2]. M. Belousov, B. Volf, J. C. Ramer, E. A. Armour, and A. Gurary, "In situ metrology advances in MOCVD growth of GaN-based materials", J. Cryst. Growth, 272, 94-99 (2004).
[3]. E. Kobeda and E. A. Irene, "A measurement of intrinsic SiO2 film stress resulting from low temperature thermal oxidation of Si", J. Vac. Sci. Technol 4, pp.720-722 (1986).
[4]. S. Hearne, E. Chason, J. Han, J. A. Floro, J. Figiel, and J. Hunter, "Stress evolution during metalorganic chemical vapor deposition of GaN", Appl. Phys. Lett 74 356-358 (1999).
[5]. S. A. Guralnick, E. S. Suen, and G. Jin, "Fast Fourier transform method for shadow moire fringe pattern analysis", Proc. SPIE 1778 160-167 (1992).
[6]. G. Mauvoisin, F. J. Bremand, and A. Lagarde, "Shadow moire by phase shifting method and applications", Proc. SPIE 2065 170-181 (1994).
[7]. Y. H. D. Yun and Z. Lei, "A method with exact phase-shifting values and its experimental techniques in shadow moire topography", Proc. SPIE 5638 783-790 (2005).
[8]. T. Y. F. Chen and J. S. Chen, "Surface warpage measurement of diamond grid disk by shadow Moire method", Proc. SPIE 9234 83213R-83213R (2011).
[9]. C. Wykes, "Use of Electronic Speckle Pattern Interferometry (ESPI) in the Measurement of Static and Dynamic Surface Displacements", Opt. Eng 21(3) 400-406 (1982).
[10]. K. T. Chen, T. P. Leung and J. Z. Zhang, "High-Speed Automatic Measurement of Out of Plane Displacement Using ESPI", Opt. Laser. Technol 25(1) 3-8 (1993).
[11]. N. K. Mohan, H. Saldner, and N. E. Molin, "Electronic Speckle Pattern Interferometry for Simultaneous Measurement of Out-of-Plane Displacement and Slope", Opt. Lett 18(21) 1861-1863 (1993).
[12]. J. P. Huignard, J. P. Herriau, and T. Valentin, "Time average holographic interferometry with photoconductive electro optic BSO crystals", Appl. Opt 16 2796-2798 (1997).
[13]. R. C. Troth and J. C. Dainty, "Holographic interferometry using anisotropic self-diffraction in BSO", Opt. Lett 16 53-55 (1991).
[14]. T. R. Judge, C. Quan, P. J. Bryanston, "Judge Holographic deformation measurements by Fourier transform technique with automatic phase unwrapping", Opt. Eng 31(3) 533-543 (1992).
[15]. J. Mu, Z. Guan, J. Kang, T. Bian, and F. Su, "Error analysis of phase shifting by varying the incident angle of parallel beams in shadow Moire", Optik, 124 6769-6771 (2013).
[16]. F. P. Chiang and G. Jaisingh, “A new optical system for moiré methods", Exp. Mech 14(11) 459-462 (1974).
[17]. L. Kocsanyi and J. Giber, "Noncontact Optical Measuring Methods of Silicon Wafer Deformation", Proc. SPIE 473 149-151 (1985).
[18]. L. Yang, "Strain measurement by three-dimensional electronic speckle pattern interferometry: potentials, limitations, and applications", Opt. Eng 42(5) 1257-1266 (2003).
[19]. G. Gulker, K. Hinsch, C. Holscher, A. Kramer, and H. Neunaber, "Electronic speckle pattern interferometry system for in situ deformation monitoring on buildings", Opt. Eng 29(7) 816-820 (1990).
[20]. D. Gabor, "A new microscopic principle", Nat 161 777-778 (1948).
[21]. E. N. Leith, and J. Upatnieks, "Reconstructed Wavefronts and Communication Theory", J. Opt. Soc. Am 52 1123-1130 (1962).
[22]. E.N. Leith, and J. Upatnieks, "Reconstructed Wavefronts with Diffused Illumination and Three-Dimensional Objects", J. Opt. Soc. Am 54(11) 1295-1301 (1964).
[23]. M. H. Horman, "An application of Wavefront Reconstruction to Interferometry", Appl. Opt, 34(3) 333-336 (1965).
[24]. D. W. Sweeney and C.M. Vest, "Measurement of Three Dimensional Temperature Fields above Heated Surface by Holographic Interferometry", Int. J. Heat. Mass. Tran 17 1443-1454 (1974).
[25]. K. C. Chang, J. M. Huang and S. M. Tieng, "Application of Laser Holographic Interferometry to Temperature Measurement in Buoyant Air Jets", J. Thermophys. Heat. Tr 6(2) 377-399 (1992).
[26]. J.E. Solid, "Hologram Interferometry Applied to Measurement of Small Static Displacement of Diffusely Reflecting Surface", Appl. Opt 8 1587-1596 (1969).
[27]. W. Z. L. Zhuang, J. P. Baird, H. M. Williamson, and R. K. Clark, "Three-Dimensional Displacement Measurement by a Holospeckle Interferometry Method", Appl. Opt 32(23) 4728-4737 (1993).
[28]. R. L. Powell and K. A. Stetson, "Interferometry Vibration Analysis by Wavefront Reconstruction", J. Opt. Soc. Am 55(12) 1593-1598 (1965).
[29]. D. S. Elenevsky, N. I. Krainyukov, Y. N. Shaposhnikov, and A. G. Khramov, "Holographic-Interferometry Method Employed for Vibration-Strength Testing of Aviation-Engine Workpieces", Opt. Laser. Eng 15(5) 357-367 (1991).
[30]. P. Marquet, et al., "Digital holographic microscopy: a noninvasive contrast imaging technique allowing quantitative visualization of living cells with subwavelength axial accuracy", Opt. Lett 30(5) 468-470 (2005).
[31]. B. Rappaz, P. Marquet, E. Cuche, Y. Emery, C. Depeursinge, and P. J. Magistretti, "Measurement of the integral refractive index and dynamic cell morphometry of living cells with digital holographic microscopy", Opt. Exp 13(23) 9361-9373 (2005).
[32]. 陳逸寧，基礎雷射全像術，全華科技圖書股份有限公司，1st ed. (2005).
[33]. G. P. Wang, "Holography for one-step fabrication of three-dimensional metallodielectric photonic crystals with a single continuous wavelength laser beam", J. Mod. Opt 5(14) 2155-2161 (2002).
[34]. W. J. Tomlinson, "Volume holograms in photochromic materials", Appl. Opt 14(10) 2456-2467 (1975).
[35]. M. R. R. Gesualdi D.Soga, and M. Muramatsu, "Real-time holographic interferometry using photorefractive sillenite crystals with phase-stepping technique", Opt. Eng 44 56-67 (2006).
[36]. N. Suzuki, Y. Tomita, and T. Kojima, "Holographic recording in TiO2 nanoparticle-dispersed methacrylate photopolymer films", Appl. Phys. Lett 81 4121, (2002).
[37]. K. Bløtekjaer, "Limitations on holographic storage capacity of photochromic and photorefractive media", Appl. Opt 18(1) 57-67 (1979).
[38]. D. L. Staebler and W. Phillips, "Hologram storage in photochromic LiNbO3", Appl. Phys. Lett 24 268 (1974).
[39]. Y. Hirshberg and E. Fischer, "Thermochromism and Photochromism", J. Chem. Phys 23 1723 (1955).
[40]. S. C. Dahlberg and C. B. Reinganum, "Photochromic switching in semiconducting films of triphenylformazan", J. Chem. Phys 76 2731 (1982).
[41]. N. Ishii, T. Kato, and J. Abea, "A real-time dynamic holographic material using a fast photochromic molecule", Sci. Rep 2 819 (2012).
[42]. N. Ishii, and J. Abe, "Fast photochromism in polymer matrix with plasticizer and real-time dynamic holographic properties", Appl. Phys. Lett 102(16) 163301 (2013).
[43]. Y. Chen, C. Wang. M. Fan, B. Yao, and N. Menke, "Photochromic fulgide for holographic recording", Opt. Mater 26 75-77 (2004).
[44]. A. L. Riikaeliane, A. P. Axenchikov, V. I. Bobrinev, E. H. Gulaniane, And V. V. Shatun, "F-1-holograms on photochromic films", IEEE J. Sel. Top. Quant. Electron, 4(11) 757-762 (1968).
[45]. 張志方，「半導體構裝於IR-reflow過程中在不同溫升速率下翹曲之研究」，國立中山大學，碩士論文，民國89年。