在通訊元件以及各式電子元件需求大量的時代中，需要高速處理以及大量運算的相關元件，例如基頻高頻的石英震盪器，但現今的石英元件的厚度跟高頻高度相關，一直是困難的製程目標，而石英微影製程是一種在微細尺度下製造微型元件的關鍵工藝之一，其在半導體製造和微奈米技術領域中扮演著重要的角色。
本文第一部份聚焦於石英微影製程中的雙面濕蝕刻技術，使用兩種玻璃蝕刻溶液在石英基板的兩側進行蝕刻，以實現並加速了微結構的製作，在AT-cut基板中圖案化直徑100μm的圓孔及150μm的橢圓圓孔，並且成功在孔洞蝕刻出垂直通道，使用了兩種蝕刻液，緩衝氧化物蝕刻劑(Buffered Oxide Etch)的單面蝕刻率為0.37μm/h，二氟化氫銨( Ammonium bifluoride) 單面蝕刻率為6.183μm /小時，第二部分為石英濕蝕刻的延伸應用，VR與AR眼鏡的舒適度與沉浸感與平板光學有著密切關係，而石英濕蝕刻產生的非等向蝕刻可以製作出非傳統的閃耀式光柵，而本文使用電子束曝光機在石英上圖案化週期400nm的光柵圖案，並使用緩衝氧化物蝕刻劑蝕刻一小時，成功蝕刻出部分光柵結構，並將結構使用嚴格耦合波分析法（Rigorous Coupled Wave Analysis, RCWA,）模擬，TE波中入射15度中有25%繞射效率，TM波中入射0度中有25%繞射效率。

With an increasing demand for communication components and various electronic devices, there is a growing need for components that can handle high-speed processing and extensive computation. Quartz oscillators are one such component, which is used for baseband and high-frequency applications. However, manufacturing quartz components that are compatible with high-frequency operation while achieving the desired thickness has proven to be a challenging task. Quartz photolithography is a crucial process in fabricating microscale components, particularly when working with fine-scale dimensions, and plays a significant role in the fields of semiconductor manufacturing and micro-nanotechnology.
The first part of this paper focuses on the double-sided wet etching technique in quartz photolithography. Two types of glass etching solutions were used to etch both sides of the quartz substrate, facilitating and expediting the fabrication of microstructures. Circular holes with diameters of 100μm and elliptical holes with diameters of 150μm were patterned in AT-cut substrates. Vertical channels were successfully etched through the holes. Two etching solutions were employed: Buffered Oxide Etch with a single-sided etching rate of 0.37μm/h, and Ammonium Bifluoride with a single-sided etching rate of 6.183μm/h.
The second part explores the extended applications of wet etching in quartz. The comfort and immersion of VR and AR glasses are closely related to flat panel optics. The anisotropic etching produced by quartz wet etching enables the creation of non-traditional diffractive gratings. In this study, a periodic grating pattern with a 400nm cycle was patterned on quartz using an electron beam exposure machine. The structure was etched for one hour using Buffered Oxide Etch, resulting in the successful fabrication of partial grating structures. The structures were then simulated using Rigorous Coupled Wave Analysis (RCWA), revealing a diffraction efficiency of 25% for TE waves at an incident angle of 15 degrees and 25% for TM waves at an incident angle of 0 degrees.

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