本實驗使用直流磁濺鍍法在室溫下來濺擊鈦靶以製備TiO2光學薄膜。以Ar為工作氣體，分(1)製鍍功率、(2)氬離子助鍍功率、(3)氧離子助鍍功率三部分來討論TiO2薄膜製鍍在玻璃和PET基板上的光學特性、表面粗糙度以及應力的影響。
當不加離子助鍍時，TiO2薄膜在玻璃基板上均有高穿透率，power 2 kw之鍍率為power 1.5 kw的1.3倍，折射率與表面粗糙度較power 1.5 kw大，而應力以power 2 kw最大。對TiO2薄膜在PET基板上亦均有高穿透率，而壓應力值以power 2 kW之-509MPa最大。
氬離子助鍍之功率低於IAD(40V,1.4A)時，不會造成TiO2薄膜在硬性基板與PET基板上之穿透率下降，且薄膜表面粗糙度變化不明顯，其中TiO2薄膜在PET基板上之應力亦無明顯之變化，但氬離子助鍍有助於提高TiO2薄膜之折射率。
氧離子助鍍可提升TiO2薄膜在玻璃基板上之折射率，但是氧離子助鍍會造成TiO2薄膜在PET上表面粗糙度變大，穿透率下降，且樣品製鍍後呈現不規則、不均勻之形變。

In this research, titanium oxide (TiO2) thin films were fabricated by DC reactive magnetron sputtering with titanium target at room temperature. Ion assisted deposition (IAD) was also conducted during the thin film deposition. The working gas was argon and oxygen, and the substrates were glass and Poly Ethylene Terephthalate (PET).
The optical properties, surface roughness and stress of the film were discussed with different sputtering and IAD power. The sputtering power was varied from 1.5 to 2 kW, and IAD power was varied from 24 to 56 W. The average transmittance of the fabricated TiO2 thin films was 91% on both glass and PET substrates.
The deposition rate, refractive index and surface roughness were increased as the function of sputtering power. The trend of thin film stress on glass and PET tended to compressive as sputtering power increased, and reached a maximum value of -509MPa on PET at 2kW.
In the case of argon IAD, the refractive index of TiO2 thin film increased as the function of ion current. However, the variation of surface roughness and stress of the film was not obvious in this case.
We figured out that the refractive index of TiO2 thin film was increased using oxygen IAD. Nevertheless, the etching effect on PET substrate by oxygen ion caused higher roughness and reduction of transmittance. The samples also deformed after the deposition process.

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