本論文以光子晶體理論為基礎，設計藍光波段全方位反射鏡，利用有限時域差分法模擬三維光子晶體。在製程上，使用陽極氧化鋁配合自我複製成膜技術製作奈米結構膜，再以電子槍蒸鍍輔以離子源助鍍系統鍍製高反射鏡多層膜堆。一般而言，三維光子晶體的製作通長使用電子束微影等方法，其製程繁瑣且昂貴，而本論文使用陽極氧化鋁的方式製作出二維結構的孔洞陣列基板，使用陽極氧化鋁製程的好處在於大幅節省成本及製作難度，並且可藉由控制電壓、酸液種類、酸液濃度、氧化時間、鹼液種類等等參數，改變基板上孔洞的週期、孔徑大小。相較於昂貴費時的電子束微影，以此方式製作的光子晶體還具備可大面積製作的優勢。此外，配合自我複製成膜技術，利用多層膜高反射鏡的製程，在二維的陽極氧化鋁基板上製作總共25層得對稱膜堆高反射鏡。
最後以多角度的光譜儀量測可見光波段之頻譜，討論光源以60度斜向入射時中心波長的偏移量，與傳統平面多層膜做比較，其中心波長的偏移量有33.3%的抑制效果。因此，本論文中的奈米週期結構之多層膜，可以利用光子能隙的效果達到全方位反射的作用。

Base on the theory of photonic crystal, an omni-directional reflector (ODR) for blue light LED was designed using finite-difference time-domain (FDTD) method. The fabrication method is combining the autocloned multilayer technique with anodized aluminum oxide (AAO) technique. The autocloned multilayer was fabricated using electron beam deposition and ion-beam-assisted deposition (IAD) system to coating multilayer on the AAO substrate..
Traditionally, the fabrication of 3-dimensional photonic crystals were using electron beam lithography technology which is complex and expensive. In this study, we use AAO method to fabricate a two- dimension hole-array substrate. This method is a low cost and easy process. Besides, the period and pore diameter can be controlled by applying the bias voltage, acid and reaction time. To compare with the electron beam lithography process, its large process area is one of the advantages. Then, 25 layers of autocloned multilayer were deposited on the two-dimension AAO substrate to achieve an ODR for blue light LED.
Finally, the reflection of the ODR was measured using a spectrometer under different incident angles. The central wavelength shifting was measured and analyzed at 60̊ of incident angle. To compare with the planar multilayer high reflector, the autocloned multilayer high reflector can reduce 33.3% of central wavelength shifting. So, the autocloned multilayer high reflector performed an ODR for blue light LED successfully.

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