近垂直X光高反射鏡是發展X光光學研究的一個關鍵元件。在波長為13.4nm的軟X光波段，鉬和矽由於其材料特性被認為是此波段的最佳層組合。目前鉬矽多層膜可得的反射率約在68~69%之間，仍低於理論值上74%的反射率，且與實際應用上所需要的70%還有差距。然而，以目前科技水準，要達到此目標是可以預期的。
本論文是以鉬矽多層膜高反鏡的研究作為主軸，主要可以分成製鍍與膜層分析兩部分。在製鍍部分，我們利用Spiller的設計理論，選擇適當的材料，並探討基板的準備與清潔，再以射頻離子束濺鍍方法製鍍鉬矽多層膜。在分析部分，我們利用硬X光(波長為1.54Å)反射率光譜先對單層膜作薄膜特性分析，並以優化方法得到最佳膜層參數。接著進入多層膜的分析，比較不同製鍍參數下的結果，並尋找整個多層膜製鍍中最適當的製鍍條件與參數。

Normal incidence multilayer mirrors are actually a key device to developing X-ray optics. Mo/Si multilayer is always the best choice for the soft X-ray wavelength(13.6nm). Calculations of the reflectivity at normal incidence of a Mo/Si stack predict a reflectivity of ~74%. However, the reflectivity of 68~69% obtained by some experimental groups are still below this value. In addition, to ensure practical application in X-ray Lithographic setups, the mirrors peak reflectivity should be no less 70%, which is feasible in the current state of technology.
We focuses on the research about Mo/Si stack X-ray mirrors in this paper. It consists of two main parts. We talk about the fabrication of the Mo/Si multilayer in the first part, including X-ray mirror design, substrate preparing and RF ion beam sputtering. In the second part, we have studied microstructure of Mo single layer by the X-ray reflectivity for wavelength 1.54 Å and make use of simplex method to find the best parameters of the film. Finally we compared and discussed the results of four samples with different conditions to choose an optimal deposition parameter.

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