本論文提出平面式矽基折射率漸變透鏡之概念，在矽基板上沉積不同折射率的氮氧化矽膜層，再以蝕刻方式定義透鏡的輪廓、大小與位置。運用梯度折射率材質與透鏡曲面之特性，使透鏡分別在水平及垂直基板方向皆有聚焦、準直之能力。此透鏡具定位精準、易與其它半導體元件結合、系統積體化與微型化等優點。
論文中針對不同的系統需求，提出符合規格之透鏡設計。另外將此透鏡應用於光耦合系統與光學讀取頭系統，並討論此透鏡之優缺點與適用性。

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