本文提出一個以準共光程為架構，可用以進行大行程位移運動的新型干涉儀式定位平台，此干涉儀式位移平台包含一準共光程量測系統及一雙伺服定位平台。
準共光程量測系統由一個外差光源、二維度的全像光柵、特製的半波片及鎖相放大器等元件所組成。本研究設計出兩種不同型式的準共光程量測系統架構，分別為單動式及差動式準共光程量測系統。其中，差動式準共光程量測系統之靈敏度、解析度及非線性相位誤差均較單動式準共光程量測系統為佳。另外，本研究利用一維度及二維度的位移運動實驗來驗證所提出之準共光程量測系統的可行性及性能，並分別將此系統之量測結果與商用電容式位移計、應變規、光學尺及干涉儀等儀器進行比對。由實驗的結果可證明此準共光程量測系統擁有一維度長行程及二維度大面積的直線(度)與位移的量測能力，並可同時維持高系統穩定性。
此外，本研究將一微步進定位平台及一平板彈簧型式的壓電致動平台結合在一起，用以進行一維度及二維度的大行程精密定位。透過最佳化的設計方法，本研究提出了最適合此平板彈簧型式的壓電致動平台的最佳化結構參數。
藉由結合此準共光程量測系統及雙伺服定位平台，本研究提出一以準共光程干涉儀為架構的精密定位系統，此定位系統之解析度及位移運動範圍分別可達到奈米級及釐米級，且同時具備極高之系統穩定性，可使用於大行程定位之相關研究及應用。

A novel interferometric stage based on quasi-common-optical-path (QCOP) configuration for large-area displacement applications has been developed. The interferometric stage includes a QCOP measurement system and dual-servo positioning stage.
The QCOP measurement system consists of a heterodyne light source, two-dimensional holographic grating, specially designed set of half wave plates and lock-in amplifiers. Two QCOP measurement configurations, for single and differential detection, were designed. The sensitivity, resolution and nonlinear phase error of the differential detection type are better than those of the single detection type. Feasibility and performances of the QCOP measurement system have been addressed and demonstrated using 1D and 2D displacement experiments and a systematic comparison with a commercial capacitive sensor, strain gauge, linear encoder and linear interferometer. The experimental results demonstrate that the QCOP measurement system has the ability to measure long-range (1D) and large-area (2D) straightness and displacement while maintaining high system stability.
Furthermore, a micro-stepper was used to integrate with a leaf-spring type PZT stage for 1D and 2D displacement positioning. The suitable parameters of leaf-spring type PZT stage were calculated using an optimization method.
By combining the QCOP measurement system with dual-servo positioning stage, the positioning resolution and range of interferometric stage can achieve the nanometer and milimeter levels with high system stability for large-scale applications.

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