近幾年來可撓式基板與電漿子學受到廣泛的關注，對於電漿子光學來說，其光學性質都可以藉由改變奈米結構與材料本身之幾何形狀、結構大小、週期性排列方式等而加以操控，新興材料鎵奈米顆粒的正在發展，有希望成為新穎材料。而本篇論文主要是探討挑選合適的高分子彈性體基板，並藉由軟微影技術將鎵奈米顆粒轉移至彈性體基板上(PDMS)，通過彈性體擁有可調性的獨特性質，利用不同拉伸應力來調整奈米顆粒間的間距，透過紫外-可見光光譜儀的量測，最終可以得知隨著奈米顆粒於彈性體基板的拉伸應力從0%增加到40%，反射特徵峰會從571 nm位移至528 nm，產生藍位移之光學特性，而吸收強度從48%上升至62%，與其他金屬產生不一樣的特性，因此推測為鎵奈米顆粒之光學性質，隨著拉伸應力增加至40%時，耦合強度會快速減弱，緣由於顆粒的間距增加而產生此特性。

In recent years, great interest has arisen in flexible substrate and plasmonic. Additionally, gallium has emerged as a promising new material for plasmonics among a growing family of novel materials. This dissertation aims to explore that choose a suitable polymer elastomer substrate and gallium nanoparticles transfer to elastomer substrate by soft lithography, because the elastomer (PDMS) has unique tenability, control spacing between nanoparticles via alter the elastomer strain ratio. We use UV-Visible spectrometer to analyze optical properties. Finally, it can be seen that with the tensile stress of the nanoparticles on the elastomer substrate increasing from 0% to 40%, the reflection characteristic peak shifted from 571 nm to 528 nm, resulting in the optical properties of the blue shift, and the absorption intensity increased from 48% To 62%, and other metals have not the same characteristics, it is speculated that the optical properties of gallium. As the tensile stress increases to 40%, the coupling strength decreases rapidly, resulting in an increase in the spacing of the particles.

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