以RF濺鍍法沉積鈮酸鋰薄膜之研究｜國立中央大學博碩士論文系統

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研究生：	黃富財 Fu-Tsai Hwang
論文名稱：	以RF濺鍍法沉積鈮酸鋰薄膜之研究 The Study of Lithium Niobate Thin Films by RF Sputtering Method
指導教授：	李清庭 Ching-Ting Lee 張正陽 Jenq-Yang Chang
口試委員:
學位類別：	博士 Doctor
系所名稱：	理學院 - 光電科學與工程學系 Department of Optics and Photonics
畢業學年度：	94
語文別：	中文
論文頁數：	115
中文關鍵詞：	鈮酸鋰薄膜
外文關鍵詞：	Lithium Niobate Thin Films
相關次數：	點閱：29 下載：0
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摘要
很高品質的鈮酸鋰薄膜以高頻磁控濺鍍法被沉積在矽及石英基板上可作為聲表面波及光波導的應用。我們探討過表面形態、紋理、結晶性、膜厚、折射率、消光係數等特性和濺鍍參數及退火過程之依存關係。我們由熱差分析儀測量最佳的濺鍍溫度。利用x光及低撂角x光繞射儀測試薄膜的結晶性。利用原子力顯微鏡測試薄膜表面的粗糙度。借助於原子力顯微鏡和x光繞射量測，以探討鈮酸鋰表面形態和結晶特性變化之機制。透過本研究發現最佳的濺鍍溫度約為575℃，最佳的氣體流量比Ar/O2 為1：1。同時發現較合適的RF濺鍍功率為100W。由橢圓儀量測鈮酸鋰薄膜之膜厚、折射率、消光係數，發現薄膜之折射率為2.2(波長為632.8奈米)它與發表的折射率值符合。同時我們量測到薄膜之消光係數約為零，這代表本研究沉積的薄膜適合作為光波導。

Abstract
Very high quality LiNbO3 films were deposited on both silicon and quartz substrates for the applications of surface acoustic wave and optical waveguide by RF magnetron sputtering. We have investigated the dependence of the surface morphology, texture, crystallinity, thickness, refractive index, extinction coefficient properties with the sputtering parameters and annealing process. The optimum deposition temperature was measured by differential thermal analysis. The crystallinity was examined by x-ray and low angle x-ray diffractometer (XRD). The roughness of LiNbO3 thin films was examined by atomic force microscopy (AFM). AFM and XRD measurements were used to investigate the mechanisms of the variation in the surface morphology and crystallinity of LiNbO3 thin films.The optimum deposition temperature was found to be about 575℃. In this investigation the optimum ratio of the mass flow Ar/O2 was found to be about 1:1. Simultaneously, the RF power necessary for texture was found to be about 100W. The thickness, refractive index and extinction coefficient of LiNbO3 thin films were examined by ellipsometer. We have found the refractive index (n) is 2.2 (at 632.8nm), which is identical with the parameter of LiNbO3 ever reported. At the same time, the extinction coefficient of LiNbO3 thin films approachs to zero , represents that these thin films are suitable for optical waveguides.

目      錄
摘要
第一章	前言……………………………………………………………..1
1-1	RF電漿濺鍍法…………………………………………………..8
(Radio-Frequency Plasma Sputtering method)
1-2	脈衝雷射沉積法………………………………………………..23
(Pulsed Laser Deposition method)
1-3	液相磊晶法……………………………………………………..28
(Liquid Phase Epitaxy method)
1-4	 溶膠-凝法…………………………………………...……….32
(Sol-Gel method)
1-5	有機金屬化學氣相沉積法……………………………………..37
(MOCVD method)
第二章	RF電漿濺鍍沉積法之工作原理…………………………......44
2-1 電漿理…………………………………………………………....44
2-1-1電漿的定義…...……………………………………………..44
2-1-2電漿的成份…...…………………………………………..…45
2-1-3電漿的參數………...……………………………………..…46
2-1-3-1平均自由路……..……………………………………...46
2-1-3-2 磁場…………………………………………………....47
2-1-3-3 加速度及熱速度……………………………………....50
2-1-4射頻電漿 (Radio Frequency Plasma, RF Plasma) ………52
2-1-5離子轟擊………………………………...………………..…53
2-1-6直流偏壓……………………………………...…………..…55
2-1-7電漿的輝光………………………………….…..………..…58
2-2濺鍍原理………………………………………….…………......62
2-2-1 RF-射頻磁控式濺鍍法………………………………….....65
2-3 RF濺鍍機之基本結構…………………………………..……....68
2-3-1 RF濺鍍機結構說明………………………………………....68
2-3-2 濺鍍機操作步驟…………………………………..……....69
第三章	Si(100)基板上沉積鈮鋰薄膜之研究………………………….71
3-1預備工作…………………………………………………....…….71
3-1-1 樣品之準備…………………………………..…………....71
3-1-2 鉬舟之準備…………………………………..…………....71
3-1-3 蒸鍍源(LiNbO3)粉末之準備…………………………......72
3-1-4 熱蒸鍍機之準備……………………………..…………....72
3-2 蒸鍍製程(Evaporation process) ………………………………74
3-2-1 抽真空……………………………..………………........74
3-2-2 基板加熱………………………………..……………......74
3-2-3 蒸鍍………………………………..……………..........75
3-3 關機與繕後處理……………………………………............76
3-3-1關機(shut down) ………………………………….........76
3-3-2 繕後……………………………………..................76
3-4 特殊處理(晶化處理) ……………………….................78
3-4-1 醋酸鎳處理………………………......................78
3-4-2 高溫爐熱退火處理(Annealing process) ..............78
3-5 薄膜特性之量測...........................................................80
3-5-1 膜厚之量測...........................................................80
3-5-2 粗糙度之量測...........................................................80
3-5-3 結晶特性之量測...........................................................80
3-5-4 薄膜折射率(n)及消光係數(k)之量測..................80
3-6 以蒸鍍法在Si(100)基板上沉積鈮酸鋰薄膜之實驗...........81
3-7 以RF濺鍍法在Si(100)基板上沉積鈮酸鋰薄膜之實驗.........85
第四章	以RF濺鍍法在Si(111)基板上沉積鈮酸鋰薄膜之研究.......89
4-1 LiNbO3 粉末晶化溫度之探討.............................90
4-2基板溫度與薄膜晶化特性之探討...........................92
4-3氣體流量Ar/O2之比例與薄膜結晶特性之影響................93
4-4 RF濺鍍功率與沈積薄膜粗糙度相關性之探討........…......94
4-5基板溫度與薄膜表面粗糙度相關性之探討...................95
4-6以低撂角XRD探討薄膜之結晶特性..........................96
4-7以低撂角XRD探討RF濺鍍功率與薄膜結晶性之相關性…........97
4-8薄膜折射率(n)、消光係數(k)及薄膜厚度之量測.............98
第五章	以RF濺鍍法在石英基板上沉積鈮酸鋰薄膜之研究………....101
第六章	結論及未來展望......................................107
第七章	參考文獻............................................110

                                

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