基於光的波動特性，一般光學系統之空間解析度受繞射極限的影響而無法辨析大小小於波長的二分之一的物體，此乃因為帶有細節訊號的高空間頻率訊號為指數衰減的倏逝波，所以於本文中探討的超透鏡則可以突破繞射極限，來達到次波長成像。
本文分兩部分，分別為介電質∕金屬膜層堆疊的三層超透鏡和多層超透鏡，並利用數值模擬軟體COMSOL Multiphysics做電磁模擬並對此進行分析，在三層超透鏡本文去比較不同膜層厚度對次波長成像之影響；而多層超透鏡，本文分別探討其不同介電質∕金屬之組合、不同膜層厚度和不同對數的影響下對其影響。經由模擬後可得三層超透鏡ZnO(20 nm)∕Ag(30 nm)∕ZnO(20 nm)在光波長365 nm，解析度可以突破繞射極限達到80 nm，而多層超透鏡Ag(12 nm)/(Ta2O5(8 nm)/Ag(12 nm))*3之解析度能夠突破繞射極限達到40 nm。

Based on the characteristic of waves of light, the spatial resolution in a general optical system is limited by the diffraction limit and it cannot distinguish objects whose size is less than one-half the wavelength. This is because the evanescent waves, which are high spatial frequency signals which carry the detailed signals, exponentially decay. The superlens which discussed in this thesis can break the diffraction limit to achieve sub-wavelength imaging.
This thesis is divided into two parts. It is a three layer superlens and multilayer superlens which are layered metal-dielectric systems. The numerical simulation software COMSOL Multiphysics will be used for electromagnetic simulation. In the part of three layer superlens, we adjust the film thickness and compare the effect in sub-wavelength imaging. And in the part of multilayer superlens, we discuss the effect of different combinations and different pairs between dielectric and metal, and different film thicknesses. After simulation,we adopted a three layer superlens ZnO(20 nm)/Ag(30 nm)/ZnO (20 nm) in sub-wavelength imaging at wavelength of 365 nm , and it can break the diffraction limit down to 80 nm, and the resolution of multilayer superlens Ag(12 nm)/(Ta2O5(8 nm)/Ag(12 nm))*3 which can break the diffraction limit reach to 40 nm.

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