| 研究生: |
廖俊豪 Jing-Hau Lai |
|---|---|
| 論文名稱: |
金屬-半導體-金屬光偵測器的特性 Characteristics of MSM Photodetectors |
| 指導教授: |
洪志旺
Jyh-Wong Hong |
| 口試委員: | |
| 學位類別: |
碩士 Master |
| 系所名稱: |
資訊電機學院 - 電機工程學系 Department of Electrical Engineering |
| 畢業學年度: | 88 |
| 語文別: | 中文 |
| 論文頁數: | 56 |
| 中文關鍵詞: | 光偵測器 |
| 外文關鍵詞: | MSM, photodetector |
| 相關次數: | 點閱:6 下載:0 |
| 分享至: |
| 查詢本校圖書館目錄 查詢臺灣博碩士論文知識加值系統 勘誤回報 |
本論文探討含非晶矽化鍺氫梯度結構薄膜的金屬-半導體-金屬光偵測器特性。藉調整梯度結構層沉積的時間與溫度及利用氫氣退火等研究所製作的各種金屬-半導體-金屬光偵測器的交、直流特性。再者,利用自動對準製程完成溝渠式電極光偵測器並探討其特性。最後,利用金屬-半導體-金屬光偵測器的結構研發出低操作電壓之大工作面積光偵測器,以利實際運用的探討。
In this thesis, first, the metal-semiconductor-metal photodetectors (MSM-PDs) with a graded hydrogenated intrinsic amorphous silicon-germanium (i-a-Si1-xGex:H) film deposited on [100] n-type silicon wafer, and the Cr top-electrodes have been studied. The effects of elapsed-time during growing graded i-a-Si1-xGex:H layer, substrate temperature and H2-annealing on device characteristics were compared and discussed.
Then, the fabrication process and characteristics of the MSM-PDs with self-aligned trench-electrodes were investigated. Their obtainable characteristics were nearly the same as those of a conventional MSM-PD with trench-electrodes, which needed an additional mask.
Finally, instead of i-a-Si1-xGex:H film, the i-a-Si:H film was used and deposited on Si wafer to form MSM-PDs with large active-area. The effects of resistivity of Si wafer on device performances were also discussed. The device linearity, knee voltage, and dark current were studied.
[1] P. D. Hodson, R. H. Wallis, J. I. Davies, and H. E. Shephard, "InGaAs PIN Photodiodes on Recessed Semi-Insulating GaAs Substrates," IEE Proceeding- J, vol. 135, no. 1, pp. 2-4, 1988.
[2] K. Wakita, I. Iotaka, K. Mogi, and Y. Kawamura, "High-Speed AlGaAs Multiple Quantum Well PIN Photodiodes," Electronics Letters, vol. 25, no. 22, pp. 1533-1534, 1989.
[3] Q. Wada, S. Miura, T. Mikawa, O. Aoki, and T. Kiyomga, "Fabrication of Monolithic Twin-GaInAs PIN Photodiode for Balanced Dual-Detector Optical Coherent Receivers," Electronics Letters, vol. 24, no. 9, pp. 514-516, 1988.
[4] T. Kakawa, N. Matsumoto, and K. Kumabe, "Amorphous Silicon Photoconductive Sensor," Jpn. J. Appl. Phys., vol. 21, Suppl. 12-1, pp. 251-256, 1981.
[5] Y. K. Fang, S. B. Hwang, K. H. Chen, C. R. Liu, and L. C. Kuo, "A Metal-Amorphous-Silicon-Germanium Alloy Schottky Barrier for Infrared Optoelectronic IC on Glass Substrate Application," IEEE Trans. Electron Devices, vol. 39, pp. 49-51, 1992.
[6] C. Y. Chang, B. S. Wu, Y. K. Fang, and R. H. Lee, "Amorphous Silicon Bulk Barrier Phototransistor with Schottky Barrier Emitter."Appl. Phys. Lett., vol. 47, pp. 49-51, 1985.
[7] S. B. Hwang, Y. K. Fang, K. H. Chen, C. R. Liu, J. D. Hwang, and M. H. Chou, "An a-Si:H/a-SiGe:H Bulk Barrier Phototransistor with an a-SiC:H Barrier Enhancement Layer for High-gain IR Optical Detector," IEEE Trans. Electron Devices, vol. 40, no. 2, pp. 342-347, 1993.
[8] S. Takayama, K. Mori, K. Suzuki, and C. Tanuma, "An a-Si:H Photoconductive Sensor with Al Gate Electrode," IEEE Trans. Electron Devices, vol. 40, no. 2, pp. 342-347, 1993.
[9] J. W. Hong, W. L. Laih, Y. W. Chen, Y. K. Fang, C. Y. Chang, and J. Gong, "Optical and Noise Characteristics of Amorphous Si/SiC Superlattice Reach-Through Avalanche Photodidoes," IEEE Trans. Electron Devices, vol. 37, no. 8, pp. 1804-1808, 1990.
[10] Y. K. Fang, S. B. Hwang, K. H. Chen, C. R. Liu, M. J. Tsai, and L. C. Kuo, "An Amorphous SiC/Si Heterojunction p-i-n Diode for Low-Noise and High-Sensitivity UV Detector," IEEE Trans. Electron Devices, vol. 39, no. 2, pp. 292-296, 1992.
[11] Dennis L. Gogers, Lightwave Technol., vol. 12, p. 625, 1991.
[12] Dennis L. Gogers, "Integrated Optical Receviers Using MSM Detectors," Journal of Lightwave Technology, vol.9, no.12, pp. 1635-1638, December 1991.
[13] S. M. Sze, Physics of Semiconductor Devices, John Wiley & Sons, Inc., 2nd ed, Chap. 10, p. 613, 1985.
[14] S.Y. Chou, Y. Liu, P.B. Fischer, "Tera-Hertz GaAs Metal-Semiconductor-Metal Photodetectors with Nanoscale Finger Spacing and Width," IEDM, pp. 745-748, 1991.
[15] S. Y. Chou, S. Alexandrou, C. C. Wang, and T. Y. Hsiang, 蔾 GHz Si MSM Photodetectors," IEEE Trans. Electron Devices, vol. 40, no. 11, pp. 2145-2146, 1993.
[16] Y. A. Chen, "Design and Fabrication of i-a-Si:H and i-a-SiGe:H Metal-Semiconductor-Metal Photodetector (MSM-PDs)," Master thesis, Institute of Electrical Engineering, Natonal Central University, Chungli, Taiwan, Republic of China, 1994.
[17] A. K. Sharma, K. A. M. Scott, S. R. J. Brueck, J. C. Zolper, and D. R. Myers, "Ion-Implantation Enhanced Metal-Si-Metal Photodetectors," IEEE Photo. Technol. Lett., vol. 6, no. 5, pp. 635-638, 1991.
[18] T. J. King, and K. C. Saraswat, "Deposition and Properties of Low-Pressure Chemical-Vapor Deposited Polycrystalline Silicon-Germanium Films," J. Electrochem. Soc., vol. 141, no. 8, pp. 2235, 1994.
[19] T. I. Kamins and D. J. Meryer, "Kinetics of Silicon-Germanium Deposition by Atmospheric-Pressure Chemical Vapor Deposition," Appl. Phys. Lett., vol. 59, no.7, pp. 178-180, 1991.
[20] J. C. Wang, "Improving the Characteristics of Amorphous Metal-Semiconductor-Metal Photodetector (MSM-PDs)," Master Thesis, Institute of Electrical Engineering, National Central University, Chungli, Taiwan, Republic of China, 1996.
[21] J. I. Chyi, T. S. Wei, J. W. Hong, W. Lin, and Y. K. Tu, " High Performance InGaAs MSM Photodetectors," ISLOE''93 Proceeding, pp. 466, 1993.
[22] B. S. Meyerson, K. J. Uram, and F. K. LeGoues, "Cooperative Growth Phenomena in Silicon/Germanium Low-Temperature Epitaxy," Appl. Phys. Lett., vol. 53, no. 25, pp. 2555-2557, 1988.
[23] K. Tanaka, Glow-Discharge Hydrogenated Amorphous Silicon, Chap. 3, KTK Scientific Publishers, 1989.
[24] T. C. Chang, "Characteristics of Metal-Semiconductor-Metal Photodetector (MSM-PDs) with Amorphous Heterojunction and Recessed or Ridged Cr Electrodes," Master Thesis, Institute of Electrical Engineering, National Central University, Chungli, Taiwan, Republic of China, 1997.