| 研究生: |
周昱宏 Yue-Hom Chou |
|---|---|
| 論文名稱: |
矽基材料共振波導光柵之濾波器 Si-based Guided Mode Resonance Filter |
| 指導教授: |
張正陽
Jenq-Yang Chang |
| 口試委員: | |
| 學位類別: |
碩士 Master |
| 系所名稱: |
理學院 - 光電科學與工程學系 Department of Optics and Photonics |
| 畢業學年度: | 93 |
| 語文別: | 中文 |
| 論文頁數: | 92 |
| 中文關鍵詞: | 矽基 、波導光柵 、濾波器 |
| 外文關鍵詞: | filter, GMR |
| 相關次數: | 點閱:12 下載:0 |
| 分享至: |
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光學濾波器,雖然不易觀察到,但在光學領域中,卻是最重要的,
它可以篩選出想要之波長,或是摒除不要之波長,而在傳統製作之濾
波器,都是利用薄膜堆積產生之干涉所達到濾波之效果,但由於其為
多層薄膜堆疊,因此相對而言製程容忍度低。本論文利用了新形式的
方式產生濾波的效果,其主要是利用次波長光柵加上波導在其相位匹
配時,會產生之共振情形,因而使得其穿透頻譜具有篩選波長的能
力,達到濾波的效果。
現今的台灣,全世界半導體的重鎮,對於製作在矽基版上面的
元件非常得心應手,現階段的製成對於製作次波長的線寬來說也不是
問題,而且已經朝向幾十奈米的線寬邁進。因此,本文利用目前已經
發展成熟的半導體製程技術與微光機電系統
(Micro-Optical-Electro-Mechanical-Systems,MOEMS)製程技術來
製作矽基版波導模態共振濾波器。而且由於其製作在矽基版上,容易
和其他矽基元件整合,因此可以容易整合成SoC(System on a Chip)系統。
參考文獻
[1] http://www.nano.com.tw/
[2] 李正中,“薄膜光學與鍍膜技術”第三版
[3] S. S. Wang, R. Magnusson, J. S. Bagby, and M. G. Moharam,
"Guided-mode resonances in planar dielectric-layer diffraction
gratings," J. Opt. Soc. Am. A 8, 1470 (1990).
[4] S. S. Wang, R. Magnusson, J. S. Bagby, and M. G. Moharam,
"Waveguide mode-induced resonances in planar diffraction gratings,"
in Annual Meeting, Vol. 18 of 1989 OSA Technical Digest Series
(Optical Society of America, Washington, D.C., 1989), p. 117.
[5] R. Magnusson and S. S. Wang, "New principle for optical filters,"
Appl. Phys. Lett. 61, 1022 (1992).
[6] R. W. Wood, ‘‘On a remarkable case of uneven distribution of light in
a diffraction grating spectrum,’’ Philos. Mag. 4, 396 (1902).
[7] A. Hessel and A. A. Oliner, "A new theory of Wood''s anomalies on
optical gratings," Appl. Opt. 10, 1275 (1965).
[8] A. Sharon, D. Rosenblatt, and A. A. Friesem ” Resonant
grating–waveguide structures for visible and near-infrared radiation” J.
Opt. Soc. Am. A 14. 11 2985(1997)
[9] R. Magnusson, D. Shin, and Z. S. Liu. “Guided-mode resonance
Brewster filter,” Opt. LETTERS 23, 612(1998)
[10] E. B. Grann, M. G. Moharam, and D. A. Pommet, “Artificial uniaxial
and biaxial dielectrics with use of two-dimensional sub-wavelength
binary gratings”, J. Opt. Soc. Am. A 11, 2695 (1994)
[11] S. Sinzinger and J. Jahns, Microoptics, Wiley-Vch, New York, 166
(1999)
[12] R. C. Tyan, P. C. Sun, A. Scherer, and Yeshayahu, “Polarizing beam
splitter based on anisotropic spectral reflectivity characteristic of
form-birefringent multilayer gratings “, Opt. Let. 21, 761 (1996)
80
[13] Kaspar F.G. ”Diffraction by thick, periodically stratified grating with
complex dielectric constant,” J. Opt. Soc. Am. 63, 37(1973)
[14] Knop K. “Rigorous diffraction theory for transmission phase grating
with deep rectangular grooves,”J. Opt. Soc. Am. 68 1206(1978)
[15] M. G.. Moharam and T. K. Gaylord, ”Rigorous coupled-wave
analysis of planar-grating diffraction,” J. Opt. Soc. Am. 71 811(1981)
[16] Ph. Lalanne and P. Chavel, Ed.,Perspectives for parallel optical
interconnects, Springer Verlag, Berlin, 1991.
[17] R. Magnusson and S. S. Wang, “Transmission bandpass
guided-mode resonance filters,” Appl. Opt. 34 8106(1995)
[18] S. S. Wang and R. Magnusson, “Design of waveguide-grating filters
with symmetrical line shapes and low sidebands,” Opt. Lett. 19 919
(1994)
[19] S. S. Wang and R. Magnusson, “Multilayer waveguide-grating
filters,” Appl. Opt. 34 2414 (1995)
[20] S. Tibuleac and R. Magnusson, “Refraction and transmission
guided-mode resonance filters,” J. Opt. Soc. Am. A 14 1617(1997)
[21] Ya Nie, Lei Wang, Zhiheng Wang and Chengjun Lai, “ Beam
selector dependent on incident angle by guided-mode resonant
subwavelength grating,” Opt. Eng., 41 2966 (2002).
[22] Donald K. Jacob, Steven C. Dunn, and M. G. Moharam, “Flat-top
narrow-band spectral response obtained from cascaded resonant
grating reflection filters,” Appl. Opt., 41 1241 (2002)
[23] Z. S. Liu, R. Magnusson, “Concept of Multiorder Multimode
Resonant Optical Filters,” IEEE Photo. Tech. Lett., 14 1091 (2002)
[24] 莊達仁, “ VLSI 製造技術”, 2002.
[25] J. Bhardwaj, H. Ashraf, J. Hopkins, I. Johnston, S. McAuley, S. Hall,
G. Nicholls, L. Atabo, A. Hynes, C. Welch, A. Barker, B. Gunn, L.
Lea, E. Guibarra, S. Watcham, “Advances in High Rate Silicon and
Oxide Etching using ICP.”
81
[26] J. Kiihamaki, H. Kattelus, J. Karttunen, S. Franssila, “Depth and
profile control in plasma etched MEMS structure”, Sensors and
Actuators, 82, 234, 2000.
[27] Masafumi Ito, Kiyoshi Kamiya, Masaru Hori, and Toshio Goto,
“Substrute reactions of Silicon nitride in a highly selective etching
process of silicon oxide over silicon nitride”, J, of Appl. Phy., 91,
No.5, 3452, 2002.
[28] R. Ramesham, C. D. Ellis, J. D. Olivas, S. Bolin, “Fabrication of
diamond membrances for MEMS using reactive ion etching of
silicon”, Thin Solid Films 330, 62, 1998.
[29] Marc Madou, Fundamentals of microfabrication, CRC Press, “Wet
Bulk Micromachining”, 145-215, 1997.
[30] J. T. Sheu, K. S. You, C. H. Wu, and K. M. Chang, “Optimization of
KOH Wet Etching Process in Silicon Nitride Nanofabrication”,
IEEE Nano, 29, 2001.