| 研究生: |
洪膺傑 Ying-Chieh Hung |
|---|---|
| 論文名稱: |
機械研磨精度之可靠度分析 The Reliability of Machine Polishing |
| 指導教授: |
葉維磬
Wei-Ching Yeh 王國雄 Kuo-Shong Wang |
| 口試委員: | |
| 學位類別: |
碩士 Master |
| 系所名稱: |
工學院 - 機械工程學系 Department of Mechanical Engineering |
| 畢業學年度: | 92 |
| 語文別: | 中文 |
| 論文頁數: | 87 |
| 中文關鍵詞: | 成本 、研磨 |
| 外文關鍵詞: | abrasion, cost |
| 相關次數: | 點閱:7 下載:0 |
| 分享至: |
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摘要
在研究可靠度問題時,可以分為兩類:1.設計參數方面以及2.壽命方面。本文所討論的是研磨精度在機械研磨製程參數變異下的可靠度問題,以期規劃最佳製程參數的選擇。
本文的主要架構,建立以狀態函數配合蒙地卡羅法,分析研磨精度之可靠度,並以機械研磨為實例分析有關研磨系統參數設計的可靠度,並做出成本分析。
在機械研磨中,如何得到良好的均勻度的是提升品質的重要指標,轉速更是影響生產成本的重要製程參數,轉速越快將使產能提高,但伴隨而來的可能是品質的下滑。其中加工條件(定位誤差)、材料特性(砥粒大小分佈)、表面粗糙度(接觸面積百分比)等是影響品質的重要參數。然而這些參數在機械研磨中扮演什麼角色,由於牽扯到誤差變異的影響,所以此類研究有其複雜性;實際上這些參數對機械研磨中的移除率以及均勻度具有相當的重要性。
本研究利用砥粒機械刮蝕移除率模型,針對加工條件(定位誤差)、材料特性(砥粒大小分佈)、表面粗糙度(接觸面積百分比)等的變異利用蒙地卡羅法模擬,並建立不同的表面粗糙度移除模式,期望能夠對機械研磨移除率與均勻度之提升有幫助。並以可靠度的觀點去評估不同的參數變異對機械研磨之影響,最後再以成本分析去選擇最佳製程轉速。
參考文獻
[1] T. Izumitani, “Polishing mechanism of optical glasses,” Glass Technology, 12, 131, 1971.
[2] F. W. Preston,“The theory and design of plate glass polishing machines,” J. Soc. Glass Technology, 11 214, 1972.
[3] Sheng-Tsai Hsieh,” A General Optimization for Slurry Injection During Chemical Mechanical Polishing,” NCU, 2002.
[4] Sheng-Jau Chen,” Theoretical Analysis and Experiments for the Effect of Pad Pattern on the Slurry Flows and Tribological Performances Arising at the Chemical Mechanical Polishing of Cu-Film Wafers,” NCKU,2003.
[5] Jyh-Woei Jean,” Research of Flat Lapping Toolpath Analysis,” TKU, 2000.
[6] K.S. Wang, E.H. Wan and W.G. Yang, “A Preliminary investigation of New Mechanical Product Development Based on Reliability Theory,” Reliability Engineering and system Safety, Vol 40, 1993, pp.187-194.
[7] W.J. Kolarik, “Creating quality concepts systems strategies and Tools,” McGraw Hill, N. Y., 1995.
[8] 張豪麟, “系統動態可靠度與其失效率關係的探討,” 國立中央大學碩士論文, 1999.
[9] 王國雄, 沈盈志, 柏恆仁, “系統可靠度退化模式之探討,” 中華民國第一屆可靠度與維護度技術研討會論文集, pp.37-43, 1995.
[10] 林冠甫, ”新產品動態可靠度的預估,”國立中央大學碩士論文,1991
[11] 許金竹, ”預防更換對機械系統動態可靠度影響之研究,”國立中央大學碩士論文, 1993
[12] 許芳勳, ”動態可靠度模型之探討及其應用,”國立中央大學博士論文, 2001
[13] 石逸群, ”累積失效與可靠度關係之探討,”國立中央大學機械工程研究所碩士論文,2000.
[14] 徐盛峰, ”低通濾波器設計可靠度分析,”國立中央大學機械工程研究所 碩士論文,2001.
[15] M.Kaneko, and Y. Fujikawa, “Boundary search approach to parameter design for analog circuits,” Circuits and Systems, 1994. APCCAS ’94., IEEE Asia-pacific Conference, 1994.
[16] R. Spence and R. Soin, “Tolerance Design of Electronic Circuits,” New York: Addison-Wesley, 1988.
[17] 梁伯任, “材料強度退化與累積損傷之探討,”國立中央大學機械工程研究所碩士論文,2000.
[18] W.M. Smith, “Reliability and Maintainability Symposium,” 1996 Proceedings. International Symposium on Product Quality and Integrity, pp. 326-334, 1996.
[19] E. Lee, T. Wilson, “Methodology for Using Circuit Simulation in the Design and Development of Electronic Power Supplies,” IEEE Power Electronics Specialists Conference, pp. 34-45, 1992.
[20] R. White, “An Introduction to Six Sigma with A Design Example,” IEEE APEC, pp.28-35, 1992.
[21] Richard Lee, “EMI filter design,” New York, 1996.
[22] K. L. Johnson, J. A. Greenwood and S. Y. Poon, “A Simple Theory of Asperity Contact In Elastohydrodynamic Lubrication,” Wear, Vol. 19, 1972, pp.91-108.
[23] S.P. Timoshenko and J.N. Goodier, Theory of Elastic, New York, MeGraw-Hill, 1951, pp.1-404.
[24] J. Pullen and J. B. P. Williamson, “On the Plastic Contact of Roughness Surfaces,” Proc. Roy. Soc. London, 1972, Series A327, pp. 157-173.
[25] W. R. Chang, I. Etsion, D. B. Bogy, “An Elastic-Plastic Model For The Contact Of Rough Surface,” Jouranl of Tribology, April 1987, Vol. 109, pp.257-263.
[26] D. Tabor, The Hardness of metals, Oxford University Press.
[27] J.N. Siddall, “Probabilistic Engineering Design Principle and Applications,” Marcel Dekker, Inc., New York, 1983.
[28] K. Okada, and N. Onodera, “Statistical modeling of device characteristics with sys thematic fluctuation,” IEEE International Symposium, Circuits and Systems, Vol.2, pp. 437-440, 2000.
[29] Finn Jensen, “Electronic Component Reliability,” New York, 1995.
[30] M.F. Kavanaugh, “Including the effects of component tolerances in the teachin of courses in introductory circuit design,” IEEE Transactions, Education Vol.38, pp. 361-364, 1995.
[31] 王建榮,林必姚,林慶福, ”半導體平坦化CMP製程,”技術,全華圖書公司,2000