本論文主要以自我複製技術(Autocloning technique)來製作微型化波導，並藉由有限時域差分法(Finite-Difference Time-Domain; FDTD) 來設計微型化波導以及利用電子束直寫技術製作所需的基板圖樣。
首先，使用有限時域差分法模擬自我複製型波導的堆疊方式，比較非對稱膜堆與對稱膜堆、SiO2/Ta2O5與SiO2/TiO2結構、各種週期大小、不同頂角下TE偏振各入射角度傳遞效率的優劣，與文獻中自我複製型波導傳遞效率相比，傳遞損耗下降幅度達76.4%。此外也探討結構核心層及包覆層之等效折射率與各項參數間的相關性。
在製程過程中，利用電子槍蒸鍍系統與離子源助鍍製作自我複製式波導，共37層，其厚度約為9.2 μm。在波長1520 nm~1570 nm，其傳遞損耗為0.1838dB/mm，可應用於通訊紅外光區塊，自我複製技術有著可大量生產且多層製作之特性，微型化波導則有著積體化的前瞻性，未來可望商業化應用於積體平面光路。

In this research, we design and fabrication low propagation loss waveguide using by Autocloning technique. Simulation the design using by Finite-Difference Time-Domain method. Comparison of several structures, such as difference accumulation type, lattice constant, vertex angle, thickness, transverse period, and two kind of heterostructure Ta2O5/SiO2 and TiO2/SiO2, which structure can reduce the Autocloned waveguide propagation loss.
In addition, we comparing the equivalent refractive index between several structures, which has the lower propagation loss and its core and cladding actually has more difference equivalent refractive index. As the result of our design, propagation loss is reduce by over 76.4% compared with the literature.
And we have fabricated the Autocloned waveguide using electron beam gun evaporation with ion-beam-assisted depositon (IAD) successfully. The structure thin film has 37 layers, which physical thickness was 9.2μm. The Autocloned waveguide had low propagation loss about 0.1838dB/mm at 1520-1570 nm in infrared region.
Autocloning technology can be mass production, and multi-layer stack is characteristics of Autocloning technology. Integrated and miniaturization of Autocloned waveguide is forward-looking. In the future, Autocloned integrated waveguide can expected to commercial application.

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