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研究生： 李金翰
Chin-Han Lee
論文名稱： 193nm深紫外光氟化物混合膜之研究
The research of fluoride composite film in DUV at 193nm
指導教授： 李正中
Cheng-Chung Lee
口試委員:
學位類別： 碩士
Master
系所名稱： 理學院 - 光電科學與工程學系
Department of Optics and Photonics
畢業學年度： 95
語文別： 中文
論文頁數： 32
中文關鍵詞： 深紫外 、氟化物混合膜 、193nm
外文關鍵詞： composite film, fluoride film, DUV, 193nm
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    • 本文中主要研究探討波長 193nm 深紫外光之混合膜，混合材料為氟化鋁(AlF3)、氟化鎂(MgF2)。氟化鋁以熱阻舟蒸鍍(Resistive Heating Boat Evaporation)、氟化鎂以電子束蒸鍍(Electron Beam Gun Evaporation)的方式製鍍光學薄膜，並使用光譜儀、橢圓偏振儀、電子顯微鏡、原子力顯微鏡、X-Ray繞射和傅利葉紅外光譜儀來探討薄膜的光學特性、微觀結構，以找出較佳的混合膜製鍍參數。

    AlF3 and MgF2 are both popular low refraction index materials which are used for coatings in UV region. In the experiment, we deposited AlF3 and MgF2 simultaneously at various depositing rate to form mixed thin films. We then further study these films by Spectrometer, Ellipsometer, SEM, AFM, XRD and FTIR, trying to investigate the properties of the mixed films and find out the best composition.

    中文摘要.............................................................I 英文摘要............................................................II 誌謝辭.............................................................III 目錄................................................................IV 圖目錄..............................................................VI 表目錄.............................................................VII 第一章 緒論..........................................................1 1-1 研究動機.........................................................1 1-2 研究方法.........................................................2 1-3 氟化物的材料特性.................................................3 第二章 研究方法......................................................4 2-1 實驗設備.........................................................4 2-1-1 基板的準備.....................................................4 2-1-2 蒸鍍系統.......................................................4 2-1-3 實驗參數.......................................................5 2-2 量測方法與儀器...................................................7 2-2-1 光學薄膜特性的量測.............................................7 2-2-2 微觀結構的量測.................................................8 2-2-3 水氣吸收的量測................................................10 第三章 結果與討論...................................................11 3-1 光學特性的量測結果..............................................11 3-1-1 穿透率對波長的關係............................................11 3-1-2 橢圓偏振儀量測................................................12 3-2 微觀結構及晶相的量測結果........................................15 3-2-1 SEM觀測結果...................................................15 3-2-2 原子力顯微鏡量測..............................................19 3-2-3 XRD 之量測....................................................21 3-3 薄膜抗水氣吸收量測..............................................22 第四章 結論.........................................................23 參考文獻............................................................24

    1. S. Güster, D. Ristau, and S. Bosch, “Spectrophotometric determination
    of absorption in the DUV/VUV spectral range for MgF2 and LaF3 thin films,” in Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries, G. A. Al-Jumaily, A. Duparre, and B. Singh, eds., Proc. SPIE 4099, 299–310 (2001).
    2. M. Zukic, D. G. Torr, J. F. Spann, and M. R. Torr, “Vacuum ultraviolet thin films. 1: Optical constants of BaF2, CaF2, LaF3, MgF2, Al2O3, HfO2 and SiO2 thin films,” Appl. Opt. 29, 4284–4292 (1990).
    3. F. Rainer, W. H. Lowdermilk, D. Milam, C. K. Camiglia, T. T. Hart, and T. L. Lichtenstein, “Materials for optical coatings in the ultraviolet,” Appl. Opt. 24, 496–500 (1985).
    4. Cheng-Chung Lee, Ming-Chung Liu, Masaaki Kaneko, Kazuhide Nakahira, and Yuuichi Takano, “Characterization of AlF¬¬3 thin films at 193nm by thermal evaporation”, Appl. Opt. 44, 7333-7338 (2005).
    5. Ming-Chung Liu, Cheng-Chung Lee, Masaaki Kaneko, Kazuhide Nakahira, and Yuuichi Takano, “Microstructure-related properties at 193nm of MgF2 and GdF3 films deposited by a resistive-heating boat”, Appl. Opt. 45, 1368-1374 (2006).
    6. U. Kaiser, M. Adamik, G. Safran, P. B. Barna, S. Laux and W. Richter, “Growth structure investigation of MgF2 and NdF3films grown by molecular beam Deposition on CaF2(111) Substrates”, Thin Solid Films 280, 5-15 (1996).
    7. David A Glocker, Handbook of Thin Film Process Technology, Bristol, UK (1995)
    8. 李正中，薄膜光學與鍍膜技術，第四版，藝軒出版社，第十章、第十一章 (2004)。
    9. R. M. A. Azzam, N. M. Bashara, ELLIPSOMETRY AND POLARIZED LIGHT, p340-363, North-Holland, New York

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