| 研究生: |
卓文浩 Wen-Hao Cho |
|---|---|
| 論文名稱: |
193nm深紫外光斜向薄膜之研究 The Research of Obliquely Deposited Films at 193nm |
| 指導教授: |
李正中
Cheng-Chung Lee |
| 口試委員: | |
| 學位類別: |
碩士 Master |
| 系所名稱: |
理學院 - 光電科學與工程學系 Department of Optics and Photonics |
| 畢業學年度: | 94 |
| 語文別: | 中文 |
| 論文頁數: | 52 |
| 中文關鍵詞: | 柱狀結構 、斜向蒸鍍 、深紫外光 |
| 外文關鍵詞: | DUV, column structure, obliquely deposited |
| 相關次數: | 點閱:16 下載:0 |
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本論文對氟化鎂、氟化鑭、氟化釓三種材料做蒸鍍角度從20 度
到70 度斜向蒸鍍,量測其柱狀傾斜角、應力以及薄膜對P、S 偏振光
垂直入射於波長193nm 的折射率。柱狀傾斜角以掃瞄式電子顯微鏡
觀察之,應力以相位移式應力量測干涉儀測量,折射率則以橢偏儀量
測,並以Cauchy Law 做擬合。柱狀傾斜角方面發現Tangent rule:
tan??E ?tan?的係數E 只有在蒸鍍角度大於50 度才會趨於定值,
不同材料其係數E 不同。隨著蒸鍍角鍍的增大會有壓應力的趨勢。然
而雙折射的特性並不是單純的隨蒸鍍角度增加而遞增,氟化鎂在蒸鍍
角度為70 度時有最大的折射率差異(0.0576)。氟化鑭需在30 度至60
度之間才明顯的折射率差異,其值約在0.03~0.04 之間。而氟化釓在
蒸鍍角度從40 度到50 度之間Ns 與Np 的大小會相反過來。應力方
面會隨著蒸鍍角度有先上升在減小的現象。
Obliquely depositing Magnesium fluoride, Lanthanum fluoride, and
Gadolinium fluoride for deposition angles in the range 20°–70°. Column
angles were determined ex situ from scanning electron microscopy
photographs of deposition-plane fractures. Stress was measured from
Phase-Shifting Interferometer. The birefringence,Δn = Ns – Np, was
determined from ellipsometer and fitted by Cauchy despersion law. We
show that the experimental column angles correspond the value predicted
by the modified form of the tangent-rule equation ??tan?1(E ?tan?)
where E is a constant for deposition angle that is larger than 50°. When
the deposition angel becomes large, the stress trend toward compressive
stress. However, birefringence does not increase progressively with the
deposition increases.Birefringence, Δ n = Ns – Np, of Magnesium
fluoride is 0.0576 for deposition angle in 70°. Birefringence of
Lanthanum fluoride becomes clear for deposition angle in the rang
30°-60°. Δn = 0.037 for deposition angle in 60°. However theΔn of
Gadolinium fluoride would be cross during deposition angle in 40° and
50°.When the deposition angle was increased, the stress would increase
first and then decrease progressively.
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