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研究生: 卓文浩
Wen-Hao Cho
論文名稱: 193nm深紫外光斜向薄膜之研究
The Research of Obliquely Deposited Films at 193nm
指導教授: 李正中
Cheng-Chung Lee
口試委員:
學位類別: 碩士
Master
系所名稱: 理學院 - 光電科學與工程學系
Department of Optics and Photonics
畢業學年度: 94
語文別: 中文
論文頁數: 52
中文關鍵詞: 柱狀結構斜向蒸鍍深紫外光
外文關鍵詞: DUV, column structure, obliquely deposited
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  • 本論文對氟化鎂、氟化鑭、氟化釓三種材料做蒸鍍角度從20 度
    到70 度斜向蒸鍍,量測其柱狀傾斜角、應力以及薄膜對P、S 偏振光
    垂直入射於波長193nm 的折射率。柱狀傾斜角以掃瞄式電子顯微鏡
    觀察之,應力以相位移式應力量測干涉儀測量,折射率則以橢偏儀量
    測,並以Cauchy Law 做擬合。柱狀傾斜角方面發現Tangent rule:
    tan??E ?tan?的係數E 只有在蒸鍍角度大於50 度才會趨於定值,
    不同材料其係數E 不同。隨著蒸鍍角鍍的增大會有壓應力的趨勢。然
    而雙折射的特性並不是單純的隨蒸鍍角度增加而遞增,氟化鎂在蒸鍍
    角度為70 度時有最大的折射率差異(0.0576)。氟化鑭需在30 度至60
    度之間才明顯的折射率差異,其值約在0.03~0.04 之間。而氟化釓在
    蒸鍍角度從40 度到50 度之間Ns 與Np 的大小會相反過來。應力方
    面會隨著蒸鍍角度有先上升在減小的現象。


    Obliquely depositing Magnesium fluoride, Lanthanum fluoride, and
    Gadolinium fluoride for deposition angles in the range 20°–70°. Column
    angles were determined ex situ from scanning electron microscopy
    photographs of deposition-plane fractures. Stress was measured from
    Phase-Shifting Interferometer. The birefringence,Δn = Ns – Np, was
    determined from ellipsometer and fitted by Cauchy despersion law. We
    show that the experimental column angles correspond the value predicted
    by the modified form of the tangent-rule equation ??tan?1(E ?tan?)
    where E is a constant for deposition angle that is larger than 50°. When
    the deposition angel becomes large, the stress trend toward compressive
    stress. However, birefringence does not increase progressively with the
    deposition increases.Birefringence, Δ n = Ns – Np, of Magnesium
    fluoride is 0.0576 for deposition angle in 70°. Birefringence of
    Lanthanum fluoride becomes clear for deposition angle in the rang
    30°-60°. Δn = 0.037 for deposition angle in 60°. However theΔn of
    Gadolinium fluoride would be cross during deposition angle in 40° and
    50°.When the deposition angle was increased, the stress would increase
    first and then decrease progressively.

    中文摘要...............................................Ⅰ 英文摘要...............................................Ⅱ 致謝...................................................Ⅲ 目錄...................................................Ⅳ 圖目錄.................................................Ⅶ 表目錄.................................................Ⅸ 第一章緒論.............................................1 1-1 前言..............................................1 1-2 研究動機..........................................1 1-3 氟化物材料特性....................................2 第二章原理.............................................5 2-1 非均向介質........................................5 2-2 非均向光學薄膜....................................7 2-3 自我遮蔽效應.....................................10 2-4 蒸鍍角度與柱狀傾斜角度...........................10 2-5 薄膜應力.........................................11 第三章實驗架構與量測儀器..............................13 3-1 實驗方法與系統架構...............................13 3-1-1 基板準備......................................13 3-1-2 鍍膜機架構....................................13 3-1-3 真空系統......................................14 3-1-4 實驗參數......................................14 3-2 量測方法與儀器...................................15 3-2-1 掃瞄式電子顯微鏡..............................15 3-2-2 柱狀傾斜角度計算..............................16 3-2-3 橢圓儀........................................18 3-2-4 相位移式應力量測干涉儀........................22 第四章實驗結果與討論..................................24 4-1 氟化鎂非均向薄膜實驗結果與討論...................24 4-1-1 蒸鍍角度與柱狀傾斜角度分析....................24 4-1-2 柱狀傾斜角度與折射率的關係....................26 4-1-3 蒸鍍角度與應力的關係..........................28 4-2 氟化鑭非均向薄膜實驗結果與討論...................30 4-2-1 蒸鍍角度與柱狀傾斜角度分析....................32 4-2-2 柱狀傾斜角度與折射率的關係....................34 4-2-3 蒸鍍角度與應力的關係..........................37 4-3 氟化釓非均向薄膜實驗結果與討論...................39 4-3-1 蒸鍍角度與柱狀傾斜角度分析....................39 4-3-2 柱狀傾斜角度與折射率的關係....................41 4-3-3 蒸鍍角度與應力的關係..........................43 4-4 綜合討論.........................................43 4-4-1 不同材料間蒸鍍角度與柱狀傾斜角度的關係........46 4-4-2 不同材料間蒸鍍角度與折射率的關係..............46 4-4-3 不同材料間蒸鍍角度與應力的關係................46 第五章結論............................................48 參考文獻..............................................50

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